Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 13/20 | 0.85 |
| ▸ | MAPK12 | P53778 | 13/20 | 0.85 |
| ▸ | MAPK11 | Q15759 | 13/20 | 0.85 |
| ▸ | MAPK14 | Q16539 | 13/20 | 0.85 |
| ▸ | RAF1 | P04049 | 5/20 | 0.85 |
| ▸ | GCGR | P47871 | 8/20 | 0.83 |
| ▸ | MAPK9 | P45984 | 1/20 | 0.68 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.65 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.62 |
| ▸ | TP53 | P04637 | 1/20 | 0.61 |
| ▸ | MAPT | P10636 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27233089 | 1.00 | MAPK13 (0.85) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL9748575 | 0.93 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL5921859 | 0.92 | MAPK13 (1.00) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL6469111 | 0.92 | MAPK13 (1.00) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL5074753 | 0.91 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL16667652 | 0.89 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL104130 | 0.89 | MAPK13 (0.82) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| Benzene SCHEMBL28852698 | 0.89 | MAPK13 (0.82) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL28149842 | 0.89 | MAPK13 (0.69) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| Methane SCHEMBL3278320 | 0.87 | MAPK13 (0.79) | MAPK13MAPK12MAPK11MAPK14RAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4321541-B1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-08-06 | — | — | EP | claimed |
| CN-119472164-A | Chiral photopolymer composition, holographic grating and holographic device | 杭州光粒科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-118184704-A | Writing monomer based on phosphine sulfur five membered heterocycle, photopolymer composition and grating | 奥提赞光晶(上海)显示技术有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-115838543-B | Photopolymer composition and grating containing organosilicon film forming agent | 杭州光粒科技有限公司 | 2024-06-07 | — | — | CN | claimed |
| CN-117529509-A | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | 三菱瓦斯化学株式会社 | 2024-02-06 | — | — | CN | claimed |
| CN-115595001-B | Photosensitive polymer composition, preparation method thereof and holographic diffraction grating element | 杭州光粒科技有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-115840347-A | Photopolymer holographic recording material containing mercapto compound, acrylate compound and epoxy compound and grating | 杭州光粒科技有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-115838543-A | Photopolymer composition containing organic silicon film forming agent and grating | 杭州光粒科技有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-112300098-B | Photopolymer composition, episulfide/epoxy writing monomer and grating | 杭州光粒科技有限公司 | 2023-01-31 | — | — | CN | claimed |
| CN-115595001-A | Photosensitive polymer composition, preparation method thereof and holographic diffraction grating element | 杭州光粒科技有限公司（CN） | 2023-01-13 | — | — | CN | claimed |
| CN-112300098-A | Photopolymer composition, episulfide/epoxy writing monomer and grating | 杭州光粒科技有限公司 | 2021-02-02 | — | — | CN | claimed |
| CN-105511227-A | Dry film resist with good hole shielding function and laminated body thereof | HANGZHOU FIRST PV MAT CO LTD | 2016-04-20 | — | — | CN | claimed |
| EP-2444396-A1 | PHOTOPROTECTIVE COMPOSITION | Apoteknos Para La Piel, S.L. (ES) | 2012-04-25 | — | — | EP | claimed |
| CN-119472164-A | Chiral photopolymer composition, holographic grating and holographic device | 杭州光粒科技有限公司 | 2025-02-18 | — | — | CN | disclosed |
| CN-117529509-B | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | 三菱瓦斯化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-115167075-B | Dispersed dye macromolecule initiated photopolymer, grating and preparation method thereof | 杭州光粒科技有限公司 | 2024-10-22 | — | — | CN | disclosed |
| CN-1292804-A | Polymeric films having controlled viscosity response to temp. and shear | DU PONT (US) | 2001-04-25 | — | — | CN | disclosed |
| CN-1270329-A | Optical imaging composition with improved chemical quality and stripping performance | SYPREY CORP (US) | 2000-10-18 | — | — | CN | disclosed |
| EP-0291977-A2 | Patterned metal interlayer in a matrix | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-11-23 | — | — | EP | disclosed |
| US-4431722-A | POLYCYCLIC QUINONE PIGMENT DISPERSED IN A RESIN BINDER AS CHARGE GENERATING LAYER; ANTIFOGGING AGENTS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-02-14 | — | — | US | disclosed |