SCHEMBL2128300

SCHEMBL2128300

C=C(CCC)C(=O)C(=C)CCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 7/20 0.47
CES1 P23141 6/20 0.47
HDAC3 O15379 4/20 0.45
HDAC1 Q13547 4/20 0.45
HDAC2 Q92769 4/20 0.45
HDAC8 Q9BY41 4/20 0.45
FFAR3 O14843 3/20 0.45
TSHR P16473 2/20 0.43
ALDH1A1 P00352 3/20 0.41
HDAC6 Q9UBN7 1/20 0.39
CTSD P07339 1/20 0.38
AKR1B1 P15121 1/20 0.33
TP53 P04637 1/20 0.33
GPR84 Q9NQS5 2/20 0.32
PPARG P37231 2/20 0.32
PPARD Q03181 2/20 0.32
PPARA Q07869 2/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
SLC22A8 Q8TCC7 1/20 0.32
TLR2 O60603 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL182305 0.82 CES1 (0.52) CES2CES1TSHRALDH1A1AKR1B1
SCHEMBL11270109 0.80 CES2 (0.55) CES2CES1TSHRALDH1A1AKR1B1
SCHEMBL1554574 0.79 CES2 (0.41) CES2CES1HDAC3HDAC1HDAC2
SCHEMBL10056217 0.79
SCHEMBL28104045 0.79
SCHEMBL6722249 0.79
SCHEMBL17818 0.79
SCHEMBL14208807 0.79 CES1 (0.61) CES2CES1HDAC3HDAC1HDAC2
SCHEMBL11511121 0.78 CES2 (0.56) CES2CES1TSHRALDH1A1AKR1B1
SCHEMBL8719599 0.78 CES2 (0.56) CES2CES1TSHRALDH1A1AKR1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10317794-B2 Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, organic electroluminescent element, colorant, and method for producing colorant FUJIFILM CORPORATION (JP) 2019-06-11 US disclosed
US-9902820-B2 Molded body and method for producing cellulose-nanofiber-containing resin composition DIC CORPORATION (JP) 2018-02-27 US disclosed
EP-3133126-A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT ELEMENT, DYE AND METHOD FOR PRODUCING DYE Fujifilm Corporation (JP) 2017-02-22 EP disclosed
US-20170010530-A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT ELEMENT, COLORANT, AND METHOD FOR PRODUCING COLORANT FUJIFILM CORPORATION (JP) 2017-01-12 US disclosed
US-9533891-B2 Washing method of goethite-containing red mud SHOWA DENKO K.K. (JP) 2017-01-03 US disclosed
US-20160237229-A1 MOLDED BODY AND METHOD FOR PRODUCING CELLULOSE-NANOFIBER-CONTAINING RESIN COMPOSITION DIC CORPORATION (JP) 2016-08-18 US disclosed
US-8895909-B2 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-8872099-B2 Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter FUJIFILM CORPORATION (JP) 2014-10-28 US disclosed
US-20130306919-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR FUJIFILM CORPORATION (JP) 2013-11-21 US disclosed
EP-2204677-B1 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor FUJIFILM CORP (JP) 2012-12-26 EP disclosed
EP-0394923-B1 Photosensitive lithographic printing plate requiring no wetting water KONISHIROKU PHOTO IND (JP) 1996-07-03 EP disclosed
US-5459010-A Photosensitive composition comprising a polymer having a 4-hydroxybutyl(meth)acrylate monomer in a mixture with a diazo compound MITSUBISHI CHEMICAL CORPORATION (JP) 1995-10-17 US disclosed
EP-0394924-B1 Photosensitive lithographic printing plate requiring no wetting water MITSUBISHI CHEM CORP (JP) 1995-07-12 EP disclosed
US-5427887-A Blend of a diazo resin and an alkali soluble and swellable polymer KONICA CORPORATION (JP) 1995-06-27 US disclosed
EP-0583962-A2 Light-sensitive composition KONICA CORPORATION (JP) 1994-02-23 EP disclosed
EP-0522457-A1 Photosensitive composition Mitsubishi Chemical Corporation (JP) 1993-01-13 EP disclosed
EP-0394923-A2 Photosensitive lithographic printing plate requiring no wetting water KONICA CORPORATION (JP) 1990-10-31 EP disclosed
EP-0394924-A2 Photosensitive lithographic printing plate requiring no wetting water Mitsubishi Chemical Corporation (JP) 1990-10-31 EP disclosed
US-4933268-A OXONOL DYE HAVING PYRAZOLONE NUCLEUS FUJI PHOTO FILM CO., LTD. (JP) 1990-06-12 US disclosed
EP-0316013-A2 Silver halide photographic material having at least one dyed hydrophilic colloid layer Fuji Photo Film Co., Ltd. (JP) 1989-05-17 EP disclosed