SCHEMBL2128794

SCHEMBL2128794

Nc1ccc(Nc2ccccc2C(=O)O)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP4 P15090 2/20 0.71
PTGS1 P23219 2/20 0.64
AKR1C3 P42330 2/20 0.64
AKR1C2 P52895 2/20 0.64
MAPT P10636 4/20 0.59
MEN1 O00255 2/20 0.59
KMT2A Q03164 2/20 0.59
ALDH1A1 P00352 2/20 0.59
TEAD4 Q15561 1/20 0.59
BLM P54132 2/20 0.56
ALOX15 P16050 2/20 0.56
KDM4E B2RXH2 1/20 0.56
TP53 P04637 1/20 0.56
APP P05067 1/20 0.56
HPGD P15428 1/20 0.56
SNCA P37840 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.56
HSD17B10 Q99714 1/20 0.56
CDC25B P30305 3/20 0.55
TTR P02766 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29740645 1.00 FABP4 (0.71) FABP4PTGS1AKR1C3AKR1C2MAPT
SCHEMBL6475563 0.91 SIRT2 (0.69) FABP4PTGS1AKR1C3AKR1C2MAPT
SCHEMBL18109767 0.91 FABP4 (0.85) FABP4PTGS1AKR1C3AKR1C2MAPT
SCHEMBL6474416 0.88 SIRT2 (0.62) FABP4PTGS1AKR1C3AKR1C2MAPT
SCHEMBL7841736 0.87 FABP4 (0.85) FABP4PTGS1AKR1C3AKR1C2MAPT
Fenamic Acid SCHEMBL29622832 0.87 FABP4 (0.92) FABP4PTGS1AKR1C3AKR1C2MAPT
Fenamic Acid SCHEMBL25828 0.87 FABP4 (0.92) FABP4PTGS1AKR1C3AKR1C2MAPT
SCHEMBL27954135 0.86 FABP4 (0.54) FABP4PTGS1AKR1C3AKR1C2MAPT
Fenamic Acid SCHEMBL11800213 0.85 FABP4 (0.89) FABP4PTGS1AKR1C3AKR1C2MAPT
Fenamic Acid SCHEMBL3657701 0.85 FABP4 (0.89) FABP4PTGS1AKR1C3AKR1C2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118290070-A Modified yarn-throwing ceramic fiber asphalt mixture, and preparation method and application thereof 山东省大通建设集团有限公司 2024-07-05 CN claimed
CN-114426703-A Silicon dioxide-based modified anti-aging agent and preparation method and application thereof 中国石油化工股份有限公司 2022-05-03 CN claimed
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 EP claimed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 WO claimed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 US claimed
CN-118290070-A Modified yarn-throwing ceramic fiber asphalt mixture, and preparation method and application thereof 山东省大通建设集团有限公司 2024-07-05 CN disclosed
CN-114426703-A Silicon dioxide-based modified anti-aging agent and preparation method and application thereof 中国石油化工股份有限公司 2022-05-03 CN disclosed
US-8703092-B2 Type separation of single-walled carbon nanotubes via two-phase liquid extraction UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2014-04-22 US disclosed
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
US-20100166637-A1 Type Separation of Single-Walled Carbon Nanotubes via Two-Phase Liquid Extraction UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. 2010-07-01 US disclosed
EP-1188580-B1 Aluminum support for planographic printing plate, process for its production, and planographic printing master place FUJIFILM CORP (JP) 2008-08-13 EP disclosed
WO-2008057070-A2 TYPE SEPARATION OF SINGLE-WALLED CARBON NANOTUBES VIA PHASE TRANSFER UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2008-05-15 WO disclosed
EP-0353873-B1 Photsensitive composition KONISHIROKU PHOTO IND (JP) 1993-12-29 EP disclosed
US-5260161-A Developability after storage for long time, press life, and ink attachibility KONICA CORPORATION (JP) 1993-11-09 US disclosed
EP-0522457-A1 Photosensitive composition Mitsubishi Chemical Corporation (JP) 1993-01-13 EP disclosed
US-5009981-A Polymerizable photosensitive diazo compound, polymeric binder, photoinitiator KONICA CORPORATION (JP) 1991-04-23 US disclosed
EP-0397375-A1 Photosensitive composition and photosensitive lithographic printing plate KONICA CORPORATION (JP) 1990-11-14 EP disclosed
EP-0353873-A1 Photsensitive composition KONICA CORPORATION (JP) 1990-02-07 EP disclosed
US-4492748-A Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith HOECHST AKTIENGESELLSCHAFT, A CORP. OF GERMANY (DE) 1985-01-08 US disclosed
US-4186017-A Light-sensitive copying composition HOECHST AKTIENGESELLSCHAFT (DE) 1980-01-29 US disclosed