Methane

Methane

SCHEMBL21294036

C.Cc1cc(-c2cc(C)c(N)c(C(C)C)c2)cc(C(C)C)c1N

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.56
CYP3A4 P08684 2/20 0.56
TSHR P16473 2/20 0.56
TDP1 Q9NUW8 2/20 0.56
TP53 P04637 1/20 0.56
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
POLB P06746 2/20 0.37
GAA P10253 1/20 0.37
GFER P55789 1/20 0.37
LMNA P02545 3/20 0.32
TRPA1 O75762 1/20 0.30
CHRM1 P11229 1/20 0.30
SLC6A2 P23975 1/20 0.30
ADRA1A P35348 1/20 0.30
HTR2B P41595 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28846206 0.98 ALDH1A1 (0.59) ALDH1A1CYP3A4TSHRTDP1TP53
Methane SCHEMBL27861345 0.85 CA1 (0.52) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL461449 0.83 CA1 (0.55) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL29926096 0.80 CA1 (0.52) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL27808479 0.79 KDM4E (0.42) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL5160431 0.79 ALDH1A1 (0.40) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL21603498 0.78 AURKA (0.41) ALDH1A1CYP3A4TSHRTDP1TP53
SCHEMBL24115940 0.77 GABRA1 (0.43) ALDH1A1CYP3A4TSHRTDP1TP53
Hydrochloric Acid SCHEMBL5430513 0.77 POLB (0.41) ALDH1A1CYP3A4TSHRTDP1TP53
Methane SCHEMBL28153016 0.77 ALDH1A1 (0.93) ALDH1A1CYP3A4TSHRTDP1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10920007-B2 Urethane resin comprising a polyrotaxane and polishing pad TOKUYAMA CORPORATION (JP) 2021-02-16 US disclosed
EP-3543267-A1 URETHANE RESIN USING POLYROTAXANE, AND POLISHING PAD Tokuyama Corporation (JP) 2019-09-25 EP disclosed
US-20190263961-A1 URETHANE RESIN COMPRISING A POLYROTAXANE AND POLISHING PAD TOKUYAMA CORPORATION (JP) 2019-08-29 US disclosed
CN-107849225-A Amine for the composition epoxy resin of low emission SIKA技术股份公司 2018-03-27 CN disclosed
CN-104884496-B Curing agent for low emission epoxy resin product SIKA技术股份公司 2017-12-29 CN disclosed
CN-105392754-A Combination of ternary binder and waterborne epoxy resin system SIKA TECH AG 2016-03-09 CN disclosed
CN-104884496-A HARDENERS FOR LOW-EMISSION EPOXY RESIN PRODUCTS SIKA TECHNOLOGY AG 2015-09-02 CN disclosed
CN-104854077-A AMINE FOR LOW-EMISSION EPOXY RESIN PRODUCTS SIKA TECHNOLOGY AG 2015-08-19 CN disclosed