SCHEMBL21295985

SCHEMBL21295985

C=Cc1ccccc1CC(=O)OC(C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 5/20 0.44
MTNR1B P49286 5/20 0.44
L3MBTL1 Q9Y468 2/20 0.38
GSTO1 P78417 1/20 0.36
MAPT P10636 2/20 0.36
RORC P51449 1/20 0.35
KDM4E B2RXH2 2/20 0.35
ALDH1A1 P00352 2/20 0.35
PTPRC P08575 2/20 0.34
MEN1 O00255 1/20 0.34
NPC1 O15118 1/20 0.34
HTT P42858 1/20 0.34
RAB9A P51151 1/20 0.34
KMT2A Q03164 1/20 0.34
GLA P06280 1/20 0.34
GAA P10253 1/20 0.34
THRB P10828 1/20 0.34
HPGD P15428 1/20 0.34
HIF1A Q16665 1/20 0.34
ADRB2 P07550 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9863289 0.83 MTNR1A (0.52) MTNR1AMTNR1BL3MBTL1RORCKDM4E
SCHEMBL5283277 0.82 KDM4E (0.43) L3MBTL1MAPTKDM4EALDH1A1
SCHEMBL10864725 0.80 L3MBTL1 (0.45) L3MBTL1MAPTALDH1A1GAATHRB
SCHEMBL1738983 0.79 CYP3A4 (0.36) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL5158220 0.78 KCNA5 (0.48) L3MBTL1MAPTADRB2HTR1A
SCHEMBL16396963 0.77 PTGDR2 (0.43) MTNR1AMTNR1BMAPTKDM4EMEN1
SCHEMBL29852860 0.77 AKR1B1 (0.55) MTNR1AMTNR1BL3MBTL1HIF1A
SCHEMBL5370276 0.77 AKR1B1 (0.55) MTNR1AMTNR1BL3MBTL1HIF1A
SCHEMBL12318344 0.77 MTNR1A (0.48) MTNR1AMTNR1BL3MBTL1MAPTALDH1A1
SCHEMBL1397119 0.76 USP2 (0.47) MAPTKDM4EALDH1A1MEN1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12449737-B2 Pattern forming method, resist material, and pattern forming apparatus Oji Holdings Corporation (JP) 2025-10-21 US disclosed
US-12248249-B2 Resist material and pattern forming method Oji Holdings Corporation (JP) 2025-03-11 US disclosed
US-20250004376-A1 RESIST MATERIAL AND PATTERN FORMING METHOD Oji Holdings Corporation (JP) 2025-01-02 US disclosed
US-20220373886-A1 RESIST MATERIAL AND PATTERN FORMING METHOD Oji Holdings Corporation (JP) 2022-11-24 US disclosed
US-20220365448-A1 PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS Oji Holdings Corporation (JP) 2022-11-17 US disclosed
WO-2021002350-A1 RESIST MATERIAL AND METHOD FOR FORMING PATTERN 王子ホールディングス株式会社 2021-01-07 WO disclosed
WO-2021002351-A1 PATTERN FORMATION METHOD, RESIST MATERIAL, AND PATTERN FORMATION DEVICE 王子ホールディングス株式会社 2021-01-07 WO disclosed
US-20200401044-A1 PATTERN-FORMING MATERIAL, PATTERN-FORMING METHOD, AND MONOMER FOR PATTERN-FORMING MATERIAL Oji Holdings Corporation (JP) 2020-12-24 US disclosed
CN-111788526-A Material for pattern formation, method for pattern formation, and single body for pattern formation material 王子控股株式会社 2020-10-16 CN disclosed
WO-2019163974-A1 MATERIAL FOR PATTERN FORMATION, PATTERN FORMING METHOD AND MONOMER FOR MATERIALS FOR PATTERN FORMATION 王子ホールディングス株式会社 2019-08-29 WO disclosed