⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1955535 | 0.65 | — | — | |
| SCHEMBL1373890 | 0.65 | — | — | |
| SCHEMBL2010865 | 0.65 | — | — | |
| SCHEMBL756331 | 0.60 | — | — | |
| SCHEMBL10931798 | 0.60 | — | — | |
| SCHEMBL15363194 | 0.48 | — | — | |
| SCHEMBL3430530 | 0.44 | — | — | |
| SCHEMBL31252448 | 0.34 | GNAI3 (0.35) | — | |
| Zinc Ion SCHEMBL4369621 | 0.28 | — | — | |
| SCHEMBL259182 | 0.28 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10796921-B2 | CMP fluid and method for polishing palladium | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| US-9799532-B2 | CMP polishing solution and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-10-24 | — | — | US | disclosed |
| US-8900473-B2 | Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMP | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| EP-2132167-B1 | METHOD FOR THE PRODUCTION OF beta-KETONITRILES | BASF SE (DE) | 2013-12-25 | — | — | EP | disclosed |
| US-8501748-B2 | Method for the production of β-ketonitriles | BASF SE (DE) | 2013-08-06 | — | — | US | disclosed |
| CN-101663617-B | Photosensitive resin composition, dry film and processed product using the same | MITSUI CHEMICALS INC | 2013-05-08 | — | — | CN | disclosed |
| US-8361605-B2 | Photosensitive resin composition, dry film, and processed product made using the same | MITSUI CHEMICALS, INC. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20130005970-A1 | Method for the production of beta-ketonitriles | BASF SE (DE) | 2013-01-03 | — | — | US | disclosed |
| US-8309751-B2 | Method for the production of β-ketonitriles | BASF SE (DE) | 2012-11-13 | — | — | US | disclosed |
| US-20120238094-A1 | CMP POLISHING SOLUTION AND POLISHING METHOD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120100718-A1 | CMP Fluid and Method for Polishing Palladium | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20110177690-A1 | POLISHING SOLUTION FOR CMP, AND METHOD FOR POLISHING SUBSTRATE USING THE POLISHING SOLUTION FOR CMP | HITACHI LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20100116532-A1 | PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, AND PROCESSED PRODUCT MADE USING THE SAME | MITSUI CHEMICALS, INC. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100105903-A1 | Method for the production of beta-ketonitriles | BASF SE (DE) | 2010-04-29 | — | — | US | disclosed |
| CN-101657415-A | Method for the production of ss-ketonitriles | BASF SE DE | 2010-02-24 | — | — | CN | disclosed |
| EP-2132167-A1 | METHOD FOR THE PRODUCTION OF -KETONITRILES | BASF SE (DE) | 2009-12-16 | — | — | EP | disclosed |
| WO-2008107397-A1 | METHOD FOR THE PRODUCTION OF β-KETONITRILES | BASF SE (DE) | 2008-09-12 | — | — | WO | disclosed |