SCHEMBL2137039

SCHEMBL2137039

OC1CCC(NC2CCC(O)CC2)CC1

nearest known ligand 0.52

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.52
ALDH1A1 P00352 1/20 0.44
HSD17B10 Q99714 1/20 0.44
TSHR P16473 1/20 0.41
KDM1A O60341 1/20 0.35
ADH1B P00325 1/20 0.33
ADH1A P07327 1/20 0.33
SHBG P04278 1/20 0.32
PIM1 P11309 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2595288 1.00 EPHX2 (0.52) EPHX2ALDH1A1HSD17B10TSHRKDM1A
SCHEMBL2648893 0.88 ALDH1A1 (0.67) EPHX2ALDH1A1HSD17B10TSHRADH1B
SCHEMBL2648892 0.88 ALDH1A1 (0.67) EPHX2ALDH1A1HSD17B10TSHRADH1B
SCHEMBL8487925 0.86 EPHX2 (0.42) EPHX2ALDH1A1HSD17B10KDM1A
SCHEMBL8487919 0.86 EPHX2 (0.42) EPHX2ALDH1A1HSD17B10TSHRKDM1A
SCHEMBL8487922 0.86 EPHX2 (0.42) EPHX2ALDH1A1HSD17B10TSHRKDM1A
SCHEMBL19313250 0.84 ALDH1A1 (0.60) EPHX2ALDH1A1HSD17B10TSHRADH1B
SCHEMBL71386 0.80
SCHEMBL12812334 0.76 EPHX2 (0.35) EPHX2KDM1A
SCHEMBL26254541 0.76 EPHX2 (0.35) EPHX2KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111417669-B Fluorine-containing active energy ray-curable resin, liquid repellent, resin composition containing same, and cured film DIC株式会社 2023-11-10 CN disclosed
US-11693310-B2 Blue curable resin composition, blue color filter, and display device including same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-07-04 US disclosed
US-20200371435-A1 BLUE CURABLE RESIN COMPOSITION, BLUE COLOR FILTER, AND DISPLAY DEVICE INCLUDING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-11-26 US disclosed
US-20160251483-A1 Reactive Functional Siloxane Compositions MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2016-09-01 US disclosed
US-8902522-B2 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same DONGWOO FINE-CHEM CO., LTD. (KR) 2014-12-02 US disclosed
US-20120099214-A1 Colored Photosensitive Resin Composition for Preparation of Color Filter of Solid-State Image Sensing Device Using 300 NM or Less Ultrashort Wave Exposure Equipment, Color Filter Using Same, and Solid-State Image Sensing Device Containing Same DONGWOO FINE-CHEM CO., LTD (KR) 2012-04-26 US disclosed
US-20090185059-A1 COLORED NEGATIVE PHOTORESIST COMPOSITION, COLORED PATTERN COMPRISING THE SAME, AND METHOD FOR PRODUCING THE COLORED PATTERN DONG-WOO FINE-CHEM. CO., LTD. (KR) 2009-07-23 US disclosed
WO-2007139312-A1 COLORED NEGATIVE PHOTORESIST COMPOSITION, COLORED PATTERN COMPRISING THE SAME, AND METHOD FOR PRODUCING THE COLORED PATTERN DONGWOO FINE-CHEM. CO., LTD. (KR) 2007-12-06 WO disclosed
US-6641961-B2 For producing color filter having pixels or black matrices with rectangular or forward-tapered cross section formed when colored photosensitive composition has high concentration of pigment SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-11-04 US disclosed
US-20020136968-A1 Colored photosensitive composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-09-26 US disclosed
US-20020094485-A1 Colored photosensitive composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-07-18 US disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed