⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6414821 | 0.83 | — | — | |
| SCHEMBL25701218 | 0.76 | — | — | |
| SCHEMBL25701233 | 0.74 | — | — | |
| SCHEMBL9973372 | 0.74 | HMGCR (0.34) | — | |
| SCHEMBL13057396 | 0.73 | MAPT (0.31) | — | |
| SCHEMBL16743494 | 0.73 | MAPT (0.31) | — | |
| SCHEMBL18872442 | 0.73 | MAPT (0.31) | — | |
| SCHEMBL19249994 | 0.73 | MAPT (0.31) | — | |
| SCHEMBL18022193 | 0.73 | MAPT (0.31) | — | |
| SCHEMBL19848753 | 0.73 | MAPT (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20190285983-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2019-09-19 | — | — | US | disclosed |