⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21374953 | 0.83 | — | — | |
| SCHEMBL13496344 | 0.74 | — | — | |
| SCHEMBL10035500 | 0.73 | MGAM (0.31) | — | |
| SCHEMBL9973372 | 0.72 | HMGCR (0.34) | — | |
| SCHEMBL12628451 | 0.71 | HMGCR (0.33) | — | |
| SCHEMBL13292167 | 0.71 | — | — | |
| SCHEMBL22242648 | 0.71 | GRM5 (0.30) | — | |
| SCHEMBL2754972 | 0.71 | GRM5 (0.30) | — | |
| SCHEMBL5667920 | 0.70 | — | — | |
| SCHEMBL13929703 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | claimed |
| US-7947421-B2 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJIFILM CORPORATION (JP) | 2011-05-24 | — | — | US | disclosed |
| US-7947421-B2 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJIFILM CORPORATION (JP) | 2011-05-24 | — | — | US | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1511901-A1 | WHITENING PIGMENTS | Ciba SC Holding AG (CH) | 2005-03-09 | — | — | EP | disclosed |
| JP-2005029516-A | 6-TRIFLUOROMETHYL-2-VINYLOXY-4-OXATRICYCLO[4.2.1.03,7]NONAN-5-ONE, AND MACROMOLECULAR COMPOUND | DAICEL CHEM IND LTD | 2005-02-03 | — | — | JP | disclosed |
| WO-2003104560-A1 | WHITENING PIGMENTS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-12-18 | — | — | WO | disclosed |