Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL216342 | 1.00 | TSHR (0.33) | TSHREPHX1 | |
| SCHEMBL217129 | 1.00 | TSHR (0.33) | TSHREPHX1 | |
| SCHEMBL2830527 | 1.00 | TSHR (0.33) | TSHREPHX1 | |
| SCHEMBL213172 | 0.98 | TSHR (0.34) | TSHREPHX1 | |
| SCHEMBL464901 | 0.94 | TSHR (0.31) | TSHR | |
| SCHEMBL13301281 | 0.92 | ASGR1 (0.32) | TSHR | |
| SCHEMBL13301284 | 0.92 | ASGR1 (0.32) | TSHR | |
| SCHEMBL11990061 | 0.91 | TSHR (0.32) | TSHR | |
| SCHEMBL13294313 | 0.91 | TSHR (0.32) | TSHR | |
| SCHEMBL214598 | 0.90 | TSHR (0.38) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120153318-A | Photosensitive resin composition, method for producing cured relief pattern using same, and method for producing polyimide film | 旭化成株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120129876-A | Negative photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-119213364-A | Photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film | 旭化成株式会社 | 2024-12-27 | — | — | CN | disclosed |
| CN-118938601-A | Negative photosensitive resin composition and method for producing cured relief pattern | 旭化成株式会社 | 2024-11-12 | — | — | CN | disclosed |
| CN-116507686-B | UV-VIS radiation curable security ink for producing dichroic security features | 锡克拜控股有限公司 | 2024-08-16 | — | — | CN | disclosed |
| CN-118363270-A | Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2024-07-19 | — | — | CN | disclosed |
| US-20240180788-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION | TOKUYAMA DENTAL CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| CN-113811556-B | Photosensitive resin composition, resin film and electronic device | 住友电木株式会社 | 2024-05-28 | — | — | CN | disclosed |
| WO-2024038705-A1 | CATIONICALLY POLYMERIZABLE RESIN COMPOSITION FOR 3D STEREOLITHOGRAPHY AND METHOD FOR PRODUCING 3D STEREOLITHOGRAPHY PRODUCT | 株式会社トクヤマデンタル | 2024-02-22 | — | — | WO | disclosed |
| EP-4310128-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION | Tokuyama Dental Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| EP-2639638-A1 | Positive photosensitive resin composition, and semiconductor device and display therewith | Sumitomo Bakelite Co., Ltd. (JP) | 2013-09-18 | — | — | EP | disclosed |
| US-20120288798-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20100197491-A1 | METHOD FOR PRODUCTION OF WATER-ABSORBABLE RESIN, AND WATER-ABSORBABLE RESIN PRODUCED BY THE METHOD | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-7728050-B2 | Curable composition, ink composition, inkjet recording method, printed matter, method for producing planographic printing plate, planographic printing plate and oxetane compound | FUJIFILM CORPORATION (JP) | 2010-06-01 | — | — | US | disclosed |
| US-7728050-B2 | Curable composition, ink composition, inkjet recording method, printed matter, method for producing planographic printing plate, planographic printing plate and oxetane compound | FUJIFILM CORPORATION (JP) | 2010-06-01 | — | — | US | disclosed |
| EP-2177566-A1 | METHOD FOR PRODUCTION OF WATER-ABSORBABLE RESIN, AND WATER-ABSORBABLE RESIN PRODUCED BY THE METHOD | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2010-04-21 | — | — | EP | disclosed |
| EP-1965256-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE AND DISPLAY USING SAME | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20070112088-A1 | Curable composition, ink composition, inkjet recording method, printer matter, method for producing planographic printing plate, planographic printing plate and oxetane compound | FUJIFILM CORPORATION | 2007-05-17 | — | — | US | disclosed |
| US-20070112088-A1 | Curable composition, ink composition, inkjet recording method, printer matter, method for producing planographic printing plate, planographic printing plate and oxetane compound | FUJIFILM CORPORATION | 2007-05-17 | — | — | US | disclosed |
| EP-1783184-A1 | Curable ink composition and oxetane compound | Fujifilm Corporation (JP) | 2007-05-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240180788-A1 | PHOTOCATIONICALLY CURABLE COMPOSITION | CRY1, CRY2, TYR | TSHR 4550/4885EPHX1 1376/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.