Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 2/20 | 0.34 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686582 | 0.88 | CYP19A1 (0.40) | CYP19A1CYP17A1CA2TSHRNPSR1 | |
| SCHEMBL19932824 | 0.83 | CYP17A1 (0.30) | CYP19A1CYP17A1 | |
| SCHEMBL6396791 | 0.82 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1 | |
| SCHEMBL14294660 | 0.79 | ALDH1A1 (0.35) | CYP19A1CYP17A1CA2ALDH1A1L3MBTL1 | |
| SCHEMBL24409366 | 0.78 | — | — | |
| SCHEMBL19819926 | 0.77 | CYP17A1 (0.30) | CYP19A1CYP17A1CA2 | |
| SCHEMBL24068236 | 0.77 | CYP17A1 (0.30) | CYP19A1CYP17A1 | |
| SCHEMBL1704343 | 0.77 | CYP17A1 (0.30) | CYP19A1CYP17A1 | |
| SCHEMBL19261603 | 0.77 | TSHR (0.52) | CYP19A1CYP17A1CA2TSHRNPSR1 | |
| SCHEMBL2605932 | 0.77 | TSHR (0.35) | CYP19A1CYP17A1CA2TSHRNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11198748-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-14 | — | — | US | disclosed |
| US-20190292287-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-09-26 | — | — | US | disclosed |