Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 13/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8399505 | 0.83 | HSD11B1 (0.46) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL7927543 | 0.83 | HSD11B1 (0.48) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL418793 | 0.82 | HSD11B1 (0.44) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| Ethane SCHEMBL27484858 | 0.80 | HSD11B1 (0.43) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL21392341 | 0.79 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL7927539 | 0.79 | HSD11B1 (0.46) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL7988293 | 0.79 | HSD11B1 (0.42) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL24361096 | 0.78 | HSD11B1 (0.48) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL1033337 | 0.78 | HSD11B1 (0.52) | HSD11B1EPHX1EPHX2FKBP1ACYP2C9 | |
| SCHEMBL1922499 | 0.77 | HSD11B1 (0.41) | HSD11B1EPHX1EPHX2FKBP1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| WO-2019181582-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2019-09-26 | — | — | WO | disclosed |