SCHEMBL21392341

SCHEMBL21392341

C=C(Cl)C(=O)OC1C(C)CC2CC(C)CC1C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25550224 0.88 HSD11B1 (0.31) HSD11B1
SCHEMBL12065392 0.80 HSD11B1 (0.34) HSD11B1
SCHEMBL21392343 0.79 HSD11B1 (0.46) HSD11B1
SCHEMBL14793088 0.79 HSD11B1 (0.33) HSD11B1
SCHEMBL12609273 0.78 HSD11B1 (0.31) HSD11B1
SCHEMBL19223257 0.69 HSD11B1 (0.37) HSD11B1
SCHEMBL25098209 0.68 EPHX1 (0.33) HSD11B1
SCHEMBL25633729 0.68 EPHX1 (0.33) HSD11B1
SCHEMBL15962400 0.67
SCHEMBL354852 0.67 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019181582-A1 POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2019-09-26 WO disclosed