Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825473 | 0.91 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL4401855 | 0.90 | TSHR (0.41) | TSHRALDH1A1 | |
| SCHEMBL44041 | 0.89 | ALDH1A1 (0.35) | TSHRALDH1A1THRBCYP17A1CYP19A1 | |
| SCHEMBL4401860 | 0.88 | TSHR (0.43) | TSHRTHRB | |
| SCHEMBL4399200 | 0.88 | TSHR (0.43) | TSHRTHRB | |
| SCHEMBL4403811 | 0.88 | TSHR (0.43) | TSHRTHRB | |
| SCHEMBL10064095 | 0.88 | ALDH1A1 (0.33) | ALDH1A1CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL30421164 | 0.87 | TSHR (0.35) | TSHRALDH1A1THRBHSD11B1 | |
| SCHEMBL14523967 | 0.86 | CYP17A1 (0.30) | CYP17A1CYP19A1 | |
| SCHEMBL685775 | 0.86 | TSHR (0.35) | TSHRALDH1A1THRBCYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 397 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025127098-A1 | PHASE DIFFERENCE FILM COMPOSITION AND SINGLE-LAYER PHASE DIFFERENCE MATERIAL | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| WO-2025127092-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-20250189896-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-12 | — | — | US | disclosed |
| CN-120051729-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2025-05-27 | — | — | CN | disclosed |
| WO-2025100122-A1 | ELECTRODE PERIPHERAL EMBEDDING MATERIAL, PRE-BAKED FILM OF ELECTRODE PERIPHERAL EMBEDDING MATERIAL, METHOD FOR PRODUCING PRE-BAKED FILM OF ELECTRODE PERIPHERAL EMBEDDING MATERIAL, AND MICRO-LED DISPLAY ELEMENT | 日産化学株式会社 | 2025-05-15 | — | — | WO | disclosed |
| US-20250136734-A1 | PROTECTIVE-FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-01 | — | — | US | disclosed |
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119768473-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-116323702-B | Method for producing single-layer phase difference material | 日产化学株式会社 | 2025-04-01 | — | — | CN | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
| US-6884566-B2 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-04-26 | — | — | US | disclosed |
| US-20040096772-A1 | Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. | 2004-05-20 | — | — | US | disclosed |
| US-20030186171-A1 | Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. | 2003-10-02 | — | — | US | disclosed |
| US-6517993-B2 | Radiation transparent; sensitivity | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-20020031719-A1 | Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. | 2002-03-14 | — | — | US | disclosed |
| US-20020031720-A1 | Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. | 2002-03-14 | — | — | US | disclosed |