Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30421164 | 0.98 | TSHR (0.35) | ALDH1A1THRBTSHRHSD11B1 | |
| Methacrylic Acid SCHEMBL5857340 | 0.95 | ALDH1A1 (0.33) | ALDH1A1THRBTSHRHSD11B1 | |
| Methacrylic Acid SCHEMBL6298155 | 0.90 | ALDH1A1 (0.42) | ALDH1A1HSD11B1 | |
| SCHEMBL213932 | 0.89 | TSHR (0.33) | ALDH1A1THRBTSHRHSD11B1CYP17A1 | |
| SCHEMBL21009450 | 0.87 | ALDH1A1 (0.33) | ALDH1A1TSHRHSD11B1 | |
| SCHEMBL17247226 | 0.87 | ALDH1A1 (0.36) | ALDH1A1THRBTSHR | |
| Acrylic Acid SCHEMBL6298827 | 0.86 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL713335 | 0.86 | HSD11B1 (0.31) | HSD11B1CYP17A1CYP19A1 | |
| SCHEMBL825473 | 0.86 | TSHR (0.38) | ALDH1A1TSHR | |
| SCHEMBL28568019 | 0.86 | THRB (0.39) | ALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3156 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4629239-A1 | SYSTEMS AND METHODS FOR CONTEXTUAL SCENE ANALYSIS | Epona AI Labs Ltd (IE) | 2025-10-08 | — | — | EP | claimed |
| US-20250293030-A1 | SOLUBILITY SWITCH TOPOGRAPHIC FILL MATERIALS AND METHODS | BREWER SCIENCE, INC. | 2025-09-18 | — | — | US | claimed |
| CN-120025480-A | Modified styrene-acrylic emulsion, interior wall coating and preparation method thereof | 立邦涂料（中国）有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119735762-A | Acrylic emulsion, application thereof and emulsion pressure-sensitive adhesive | 成都友一包装材料有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119286334-B | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-118230956-B | Acute myocardial infarction prognosis risk monitoring system and method thereof | 首都医科大学附属北京安贞医院 | 2025-02-25 | — | — | CN | claimed |
| CN-119286334-A | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-119264321-A | Method for regulating and controlling molecular weight change of electronic grade acrylic resin | 厦门大学 | 2025-01-07 | — | — | CN | claimed |
| US-6548221-B2 | Comprising 2-alkyl-2-adamantyl (meth)acrylate monomer; for production of semiconductors via lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | claimed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | claimed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | claimed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | claimed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | claimed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | claimed |
| CN-1268680-A | Chemical enhancement type positive photoetching gum composition | SUMOTOMO CHEMICAL CO LTD (JP) | 2000-10-04 | — | — | CN | claimed |
| CN-1261171-A | Chemically enhanced possitive photoetching compositions | SUMITOMO CHEMICAL CO (JP) | 2000-07-26 | — | — | CN | claimed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | claimed |
| CN-1245910-A | Chemical intensified positive photoresist composite | SUMITOMO CHEMICAL CO (JP) | 2000-03-01 | — | — | CN | claimed |