SCHEMBL21396239

SCHEMBL21396239

O=C(CCC1CCCC1)Oc1c2ccccc2c(OC(=O)CCC2CCCC2)c2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KLK7 P49862 3/20 0.51
SMN1; SMN2 Q16637 4/20 0.48
L3MBTL1 Q9Y468 3/20 0.48
LMNA P02545 1/20 0.48
TP53 P04637 1/20 0.48
TSHR P16473 1/20 0.48
MAPK1 P28482 1/20 0.48
HTT P42858 1/20 0.48
TDP1 Q9NUW8 4/20 0.47
ALDH1A1 P00352 3/20 0.47
POLB P06746 1/20 0.47
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
HPGD P15428 4/20 0.45
NFKB1 P19838 1/20 0.44
NFKB2 Q00653 1/20 0.44
RELA Q04206 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21396240 0.88 ALDH1A1 (0.50) KLK7SMN1; SMN2L3MBTL1LMNATP53
SCHEMBL20356143 0.86 L3MBTL1 (0.41) KLK7SMN1; SMN2L3MBTL1LMNATP53
SCHEMBL21396237 0.85 ALDH1A1 (0.45) KLK7SMN1; SMN2L3MBTL1TDP1ALDH1A1
SCHEMBL23169822 0.81 TDP1 (0.55) KLK7SMN1; SMN2L3MBTL1LMNATP53
SCHEMBL8812255 0.75 HPGD (0.41) KLK7L3MBTL1TDP1ALDH1A1POLB
SCHEMBL9174688 0.75 TDP1 (0.52) KLK7SMN1; SMN2L3MBTL1LMNATSHR
SCHEMBL32671701 0.75 KLK7 (0.52) KLK7L3MBTL1LMNATDP1ALDH1A1
SCHEMBL28537948 0.75 HPGD (0.48) KLK7LMNAHTTALDH1A1RAB9A
SCHEMBL29372046 0.73 BCL9 (0.46) SMN1; SMN2L3MBTL1LMNATP53MAPK1
SCHEMBL20398454 0.73 BCL9 (0.46) SMN1; SMN2L3MBTL1LMNATP53MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11787959-B2 Radiation curable gravure ink CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. (CN) 2023-10-17 US disclosed
US-11787959-B2 Radiation curable gravure ink CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. (CN) 2023-10-17 US disclosed
EP-3770222-B1 RADIATION CURABLE COMPOSITION CONTAINING MODIFIED PIGMENT AND USE THEREOF CHANGZHOU GREEN PHOTOSENSITIVE MAT CO LTD (CN) 2023-06-07 EP disclosed
US-11525062-B2 Radiation curable composition containing modified pigment and use thereof CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. (CN) 2022-12-13 US disclosed
US-20210115276-A1 Radiation curable Gravure Ink CHANGZHOU GREEN PHOTOSENSITIVE MAT CO LTD (CN) 2021-04-22 US disclosed
US-20210095140-A1 Radiation Curable Composition Containing Modified Pigment and Use Thereof CHANGZHOU GREEN PHOTOSENSITIVE MAT CO LTD (CN) 2021-04-01 US disclosed
EP-3770222-A1 RADIATION CURABLE COMPOSITION CONTAINING MODIFIED PIGMENT AND USE THEREOF Changzhou Green Photosensitive Materials Co., Ltd. (CN) 2021-01-27 EP disclosed
WO-2019179461-A1 RADIATION CURABLE COMPOSITION CONTAINING MODIFIED PIGMENT AND USE THEREOF 常州格林感光新材料有限公司 2019-09-26 WO disclosed
WO-2019179460-A1 RADIATION-CURABLE GRAVURE INK 常州格林感光新材料有限公司 2019-09-26 WO disclosed