⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL179683 | 0.81 | — | — | |
| SCHEMBL2785699 | 0.78 | — | — | |
| SCHEMBL28282111 | 0.78 | — | — | |
| SCHEMBL4144183 | 0.72 | — | — | |
| SCHEMBL5500422 | 0.71 | — | — | |
| SCHEMBL1467145 | 0.71 | — | — | |
| SCHEMBL7054256 | 0.71 | — | — | |
| SCHEMBL18431793 | 0.71 | — | — | |
| SCHEMBL7388302 | 0.71 | — | — | |
| SCHEMBL27900708 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117425857-A | Photosensitive composition, cured film using same, color filter, optical filter, image display device, solid-state imaging element, and infrared sensor | 东洋油墨SC控股株式会社 | 2024-01-19 | — | — | CN | disclosed |
| WO-2023038092-A1 | PHOTOSENSITIVE COMPOSITION, CURED FILM OBTAINED THEREFROM, COLOR FILTER, OPTICAL FILTER, IMAGE DISPLAY DEVICE, SOLID IMAGING ELEMENT, AND INFRARED SENSOR | 東洋インキＳＣホールディングス株式会社 | 2023-03-16 | — | — | WO | disclosed |
| WO-2021132631-A1 | THERMALLY CURABLE HARDCOAT AGENT, LAYERED FILM, AND DECORATED MOLDED OBJECT | 東洋インキＳＣホールディングス株式会社 | 2021-07-01 | — | — | WO | disclosed |
| EP-3438135-B1 | PHOTOCURABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME | OSAKA SODA CO LTD (JP) | 2020-09-23 | — | — | EP | disclosed |
| CN-107614554-B | Organic-inorganic composite | 日本曹达株式会社 | 2020-07-17 | — | — | CN | disclosed |
| CN-107112366-B | Organic thin film transistor | 日本曹达株式会社 | 2020-07-10 | — | — | CN | disclosed |
| EP-3674272-A1 | COATING MATERIAL FOR OPTICAL FIBER, COATED OPTICAL FIBER, AND METHOD FOR PRODUCING COATED OPTICAL FIBER | FURUKAWA ELECTRIC CO., LTD. (JP) | 2020-07-01 | — | — | EP | disclosed |
| US-20200181417-A1 | COATING MATERIAL FOR OPTICAL FIBER, COATED OPTICAL FIBER, AND MANUFACTURING METHOD OF COATED OPTICAL FIBER | FURUKAWA ELECTRIC CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| US-10604600-B2 | Photocurable resin composition and cured product of same | OSAKA SODA CO., LTD. (JP) | 2020-03-31 | — | — | US | disclosed |
| CN-106463408-B | Organic semiconductor device | 日本曹达株式会社 | 2019-09-03 | — | — | CN | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
| US-6797450-B2 | ALKALI-SOLUBLE RESIN HAVING NO EPOXY GROUP AND A 1,2-QUINONEDIAZIDE COMPOUND | JSR CORPORATION (JP) | 2004-09-28 | — | — | US | disclosed |
| US-6756165-B2 | ALKALI SOLUBLE RESIN, UNSATURATED POLYMERIZABLE COMPOUND, RADIATION SENSITIVE POLYMERIZATION INITIATOR | JSR CORPORATION (JP) | 2004-06-29 | — | — | US | disclosed |
| EP-1057859-B1 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR CORP (JP) | 2004-05-19 | — | — | EP | disclosed |
| EP-1312982-A1 | RADIATION-SENSITIVE COMPOSITION, INSULATING FILM AND ORGANIC EL DISPLAY ELEMENT | JSR Corporation (JP) | 2003-05-21 | — | — | EP | disclosed |
| US-20030054284-A1 | Radiation-sensitive composition, insulating film and organic el display element | JSR CORPORATION (JP) | 2003-03-20 | — | — | US | disclosed |
| US-6399267-B1 | COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER | JSR CORPORATION (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |