Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 8/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21398470 | 0.71 | ALDH1A1 (0.41) | ALDH1A1HSD17B10MEN1KMT2AEPHX2 | |
| SCHEMBL21396922 | 0.70 | EPHX2 (0.41) | ALDH1A1HSD17B10MEN1KMT2AEPHX2 | |
| SCHEMBL21135981 | 0.70 | ALDH1A1 (0.38) | ALDH1A1HSD17B10MEN1KMT2AEPHX2 | |
| SCHEMBL21398831 | 0.69 | ALDH1A1 (0.46) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL23140674 | 0.66 | EPHX2 (0.40) | ALDH1A1HSD17B10EPHX2TSHR | |
| SCHEMBL21397017 | 0.65 | GRM2 (0.37) | ALDH1A1HSD17B10MEN1KMT2AEPHX2 | |
| SCHEMBL15858317 | 0.65 | ALDH1A1 (0.44) | ALDH1A1MEN1KMT2A | |
| SCHEMBL27437339 | 0.65 | GRM2 (0.45) | ALDH1A1HSD17B10MEN1KMT2AEPHX2 | |
| SCHEMBL21397010 | 0.64 | MEN1 (0.51) | ALDH1A1MEN1KMT2ACYP2D6EPHX2 | |
| SCHEMBL13062249 | 0.64 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190294042-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |