Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | CASP6 | P55212 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12256177 | 0.83 | POLB (0.40) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL12705158 | 0.79 | POLB (0.40) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL686593 | 0.74 | ALDH1A1 (0.37) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL12256175 | 0.73 | POLB (0.49) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL12705400 | 0.73 | MAPK1 (0.38) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL18748723 | 0.72 | KDM4E (0.43) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL14015365 | 0.72 | ALDH1A1 (0.35) | ALDH1A1HPGDPOLBKDM4ESMN1; SMN2 | |
| SCHEMBL28658121 | 0.72 | POLB (0.40) | ALDH1A1HPGDPOLBKDM4EHSD17B10 | |
| SCHEMBL15858404 | 0.71 | — | — | |
| SCHEMBL21398822 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20210318616-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20190294042-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |