Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.32 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.32 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.31 |
| ▸ | MMP13 | P45452 | 1/20 | 0.31 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21374608 | 0.82 | LMNA (0.47) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21396546 | 0.74 | LMNA (0.41) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21396967 | 0.73 | LMNA (0.37) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21375042 | 0.72 | EPHX1 (0.41) | LMNAMMP1MMP9 | |
| SCHEMBL27437017 | 0.70 | LMNA (0.53) | LMNA | |
| SCHEMBL21939485 | 0.68 | LMNA (0.50) | LMNASLC1A3SLC1A2SLC1A1MMP1 | |
| SCHEMBL2908890 | 0.67 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21671190 | 0.67 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21671173 | 0.67 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL2906290 | 0.66 | LMNA (0.50) | LMNASLC1A3SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20210318616-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20190294042-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |