Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.35 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.35 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.35 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | STS | P08842 | 3/20 | 0.31 |
| ▸ | CTSL | P07711 | 1/20 | 0.31 |
| ▸ | CTSB | P07858 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21374608 | 0.91 | LMNA (0.47) | LMNASLC1A3SLC1A2SLC1A1CTSL | |
| SCHEMBL21396652 | 0.87 | CYP19A1 (0.41) | CYP19A1L3MBTL1EPHX1CYP2C19NAAA | |
| SCHEMBL21396709 | 0.81 | EPHX1 (0.40) | CYP19A1L3MBTL1EPHX1NAAAHTT | |
| SCHEMBL21375042 | 0.77 | EPHX1 (0.41) | LMNAL3MBTL1EPHX1 | |
| SCHEMBL27437355 | 0.76 | CYP19A1 (0.47) | LMNACYP19A1L3MBTL1EPHX1SLC1A3 | |
| SCHEMBL21396664 | 0.76 | ALDH1A1 (0.40) | CYP19A1L3MBTL1EPHX1CYP2C19 | |
| SCHEMBL21396923 | 0.74 | LMNA (0.37) | LMNASLC1A3SLC1A2SLC1A1 | |
| SCHEMBL21396548 | 0.74 | EPHX1 (0.35) | CYP19A1L3MBTL1EPHX1NAAAHTT | |
| SCHEMBL21396666 | 0.74 | HTT (0.39) | CYP19A1L3MBTL1EPHX1CYP2C19NAAA | |
| SCHEMBL2191893 | 0.73 | LMNA (0.50) | LMNACYP19A1L3MBTL1EPHX1SLC1A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20210318616-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-10-14 | — | — | US | disclosed |
| US-11073762-B2 | Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator | FUJIFILM CORPORATION (JP) | 2021-07-27 | — | — | US | disclosed |
| US-20190294043-A1 | ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |
| US-20190294042-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11073762-B2 | Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator | PRKAR2A, PRKAR2B, RER1 | LMNA 1888/4885CYP19A1 2597/4885L3MBTL1 4103/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.