SCHEMBL21403444

SCHEMBL21403444

CCO[Si](OCC)(OCC)C(C)[Si](C)(C)C(C)[Si](OCC)(OCC)OCC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL138891 0.85 LMNA (0.35) LMNA
SCHEMBL331509 0.83 LMNA (0.30) LMNA
SCHEMBL7617694 0.82 LMNA (0.33) LMNA
SCHEMBL12458697 0.81
SCHEMBL1819389 0.81
SCHEMBL6266592 0.80 LMNA (0.32) LMNA
SCHEMBL3675111 0.79
SCHEMBL5580663 0.79
SCHEMBL28325076 0.78 LMNA (0.30) LMNA
SCHEMBL19547824 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11739184-B2 Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-29 US disclosed
EP-3798252-B1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME SHINETSU CHEMICAL CO (JP) 2022-06-29 EP disclosed
US-11279848-B2 Polysilazane composition, coated substrate, and multilayer construction SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-22 US disclosed
US-20210095079-A1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-04-01 US disclosed
EP-3798252-A1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME Shin-Etsu Chemical Co., Ltd. (JP) 2021-03-31 EP disclosed
US-20210062040-A1 POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-04 US disclosed
EP-3546498-B1 POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION SHINETSU CHEMICAL CO (JP) 2020-10-07 EP disclosed
CN-110317457-A Polysilazane composition, coating substrate and multilayer structure making 信越化学工业株式会社 2019-10-11 CN disclosed
EP-3546498-A1 POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION Shin-Etsu Chemical Co., Ltd. (JP) 2019-10-02 EP disclosed