⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4354632 | 0.91 | — | — | |
| SCHEMBL1819389 | 0.87 | — | — | |
| SCHEMBL7103186 | 0.84 | — | — | |
| SCHEMBL138891 | 0.81 | LMNA (0.35) | — | |
| SCHEMBL7103439 | 0.80 | — | — | |
| SCHEMBL331509 | 0.79 | LMNA (0.30) | — | |
| SCHEMBL21403444 | 0.79 | LMNA (0.30) | — | |
| SCHEMBL7617694 | 0.78 | LMNA (0.33) | — | |
| SCHEMBL19547824 | 0.78 | — | — | |
| SCHEMBL7101672 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-20240093058-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2024-03-21 | — | — | US | claimed |
| EP-4274866-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | Merck Patent GmbH (DE) | 2023-11-15 | — | — | EP | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| WO-2022148757-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-14 | — | — | WO | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| EP-3830196-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2021-06-09 | — | — | EP | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| EP-3735325-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2020-11-11 | — | — | EP | claimed |
| WO-2020028214-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2020-02-06 | — | — | WO | claimed |
| US-20200035494-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-01-30 | — | — | US | claimed |
| US-20190211210-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-07-11 | — | — | US | claimed |
| WO-2019135901-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2019-07-11 | — | — | WO | claimed |
| US-8703866-B2 | Room temperature curable organopolysiloxane composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-22 | — | — | US | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | disclosed |
| US-20250011628-A1 | RELEASE COMPOSITION, ARTICLES PREPARED FROM THE RELEASE COMPOSITION, AND RELATED METHODS | 3M INNOVATIVE PROPERTIES COMPANY | 2025-01-09 | — | — | US | disclosed |
| US-20100130658-A1 | ROOM TEMPERATURE CURABLE ORGANOPOLYSILOXANE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| EP-2130873-A1 | Room temperature curable organopolysiloxane composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-20090286916-A1 | ROOM TEMPERATURE CURABLE ORGANOPOLYSILOXANE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |