SCHEMBL2140678

SCHEMBL2140678

C=C(C)C(=O)Oc1ccccc1I

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.49
FABP7 O15540 1/20 0.44
FABP3 P05413 1/20 0.44
FABP5 Q01469 1/20 0.44
TDP1 Q9NUW8 2/20 0.39
ATM Q13315 2/20 0.39
KDM4E B2RXH2 4/20 0.39
ALDH1A1 P00352 3/20 0.39
HSD17B10 Q99714 3/20 0.39
PTGS2 P35354 3/20 0.39
HPGD P15428 2/20 0.39
ESR1 P03372 1/20 0.39
ITGB3 P05106 1/20 0.39
ITGA2B P08514 1/20 0.39
HMGB1 P09429 1/20 0.39
TSHR P16473 1/20 0.39
GGT1 P19440 1/20 0.39
PTGS1 P23219 1/20 0.39
BLM P54132 1/20 0.39
NAPRT Q6XQN6 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL245711 0.86 ELANE (0.44) ELANEFABP7FABP3FABP5TDP1
SCHEMBL30803748 0.86 ELANE (0.56) ELANETDP1ATMKDM4EALDH1A1
SCHEMBL30803750 0.86 ELANE (0.56) ELANETDP1ATMKDM4EALDH1A1
SCHEMBL1232932 0.86 ELANE (0.56) ELANETDP1ATMKDM4EALDH1A1
SCHEMBL177166 0.82 PTGS2 (0.57) FABP7FABP3FABP5TDP1KDM4E
SCHEMBL31604474 0.82 PTGS2 (0.57) FABP7FABP3FABP5TDP1KDM4E
SCHEMBL28127013 0.80 FABP7 (0.41) ELANEFABP7FABP3FABP5TDP1
SCHEMBL6242232 0.80 PTGS2 (0.55) FABP7FABP3FABP5TDP1KDM4E
SCHEMBL8962026 0.80 ELANE (0.51) ELANETDP1ATMKDM4EALDH1A1
SCHEMBL10399814 0.80 ELANE (0.51) ELANEFABP7FABP3FABP5TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128647-A1 POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING SAME 주식회사 동진쎄미켐 2024-06-20 WO disclosed
US-20230205082-A9 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2023-06-29 US disclosed
US-20230205082-A9 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2023-06-29 US disclosed
US-7862800-B1 Radiopaque cyanoacrylate compositions HENKEL AG & CO. KGAA (DE) 2011-01-04 US disclosed
EP-1843800-B1 RADIOPAQUE CYANOACRYLATE COMPOSITIONS HENKEL AG & CO KGAA (DE) 2009-05-13 EP disclosed
EP-1843800-A1 RADIOPAQUE CYANOACRYLATE COMPOSITIONS BACKGROUND OF THE INVENTION HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2007-10-17 EP disclosed
WO-2006074890-A1 RADIOPAQUE CYANOACRYLATE COMPOSITIONS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2006-07-20 WO disclosed