SCHEMBL214229

SCHEMBL214229

C=Cc1ccc2c([N+](=O)[O-])ccc(Br)c2c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.40
MAPT P10636 4/20 0.40
KDM4E B2RXH2 3/20 0.40
CTSB P07858 2/20 0.40
TDP1 Q9NUW8 3/20 0.39
HPGD P15428 3/20 0.36
LMNA P02545 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
MAPK1 P28482 1/20 0.36
XDH P47989 1/20 0.36
ALDH5A1 P51649 1/20 0.35
ABAT P80404 1/20 0.35
VCAM1 P19320 1/20 0.35
CYP2D6 P10635 1/20 0.35
HPRT1 P00492 1/20 0.34
CYP3A4 P08684 3/20 0.33
CYP1A2 P05177 1/20 0.33
POLB P06746 1/20 0.33
CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16958918 0.82 MAPT (0.55) ALDH1A1MAPTKDM4ECTSBHPGD
SCHEMBL16956776 0.82 CYP19A1 (0.43) ALDH1A1MAPTKDM4ECTSBTDP1
SCHEMBL214636 0.79 ALDH1A1 (0.43) ALDH1A1MAPTTDP1TSHR
SCHEMBL31335110 0.79 ALDH1A1 (0.43) ALDH1A1MAPTTDP1TSHR
SCHEMBL14928263 0.73 AAK1 (0.48) ALDH1A1MAPTKDM4ECTSBTDP1
SCHEMBL8722948 0.72 TDP1 (0.61) ALDH1A1MAPTKDM4ECTSBTDP1
SCHEMBL1546955 0.71 TDP1 (0.58) ALDH1A1MAPTKDM4ETDP1HPGD
SCHEMBL13981566 0.71 MAPT (0.59) ALDH1A1MAPTKDM4ECTSBTDP1
SCHEMBL16954832 0.71 MAPK1 (0.58) ALDH1A1MAPTTDP1HPGDLMNA
SCHEMBL5458282 0.71 MAPT (0.51) ALDH1A1MAPTKDM4ETDP1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780600-B1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM NISSAN CHEMICAL IND LTD (JP) 2014-02-26 EP disclosed
US-8088546-B2 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-01-03 US disclosed
CN-1977220-B Lower layer film forming composition for lithography including naphthalene ring having halogen atom NISSAN CHEMICAL IND LTD 2010-12-01 CN disclosed
US-20070238029-A1 Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-11 US disclosed
EP-1780600-A1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM Nissan Chemical Industries, Ltd. (JP) 2007-05-02 EP disclosed