SCHEMBL2148367

SCHEMBL2148367

C=CCOCC(C)OCC(C)OC(=O)C(=C)C

nearest known ligand 0.40

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.40
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA7 P43166 1/20 0.35
TDP1 Q9NUW8 2/20 0.33
CA9 Q16790 1/20 0.33
THRB P10828 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2187422 0.95 TSHR (0.43) TSHRCA1CA2CA7TDP1
SCHEMBL17109947 0.88 TSHR (0.40) TSHRCA1CA2CA7TDP1
SCHEMBL170338 0.87 TSHR (0.38) TSHRCA1CA2CA7TDP1
SCHEMBL562466 0.87 TSHR (0.38) TSHRCA1CA2CA7TDP1
SCHEMBL9173131 0.87 TSHR (0.47) TSHRTDP1THRBALDH1A1
SCHEMBL28437216 0.83 TSHR (0.39) TSHRCA1CA2CA7TDP1
SCHEMBL887769 0.82 THRB (0.44) TSHRTDP1THRBALDH1A1
SCHEMBL3116543 0.82 THRB (0.44) TSHRTDP1THRBALDH1A1
SCHEMBL6571877 0.82 THRB (0.44) TSHRTDP1THRBALDH1A1
SCHEMBL12304692 0.82 TSHR (0.52) TSHRTDP1THRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114622406-B Piezoresistive yarn preparation method and piezoresistive yarn prepared by same 水木山海科技(佛山)有限责任公司 2023-10-13 CN claimed
CN-114622406-A Piezoresistive yarn preparation method and piezoresistive yarn prepared by piezoresistive yarn preparation method 佛山(华南)新材料研究院 2022-06-14 CN disclosed
US-20110163482-A1 PHOTO-CURABLE COMPOSITION HAVING INHERENTLY EXCELLENT RELEASING PROPERTY AND PATTERN TRANSFER PROPERTY, METHOD FOR TRANSFERRING PATTERN USINGTHE COMPOSITION AND LIGHT RECORDING MEDIUM HAVING POLYMER PATTERN LAYER PRODUCED USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-07-07 US disclosed
US-20080176049-A1 PHOTO-CURABLE COMPOSITION HAVING INHERENTLY EXCELLENT RELEASING PROPERtY AND PATTERN TRANSFER PROPERTY, METHOD FOR TRANSFERRING PATTERN USING THE COMPOSITION AND LIGHT RECORDING MEDIUM HAVING POLYMER PATTERN LAYER PRODUCED USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-07-24 US disclosed