SCHEMBL2149596

SCHEMBL2149596

CCCCCCCCCCCCCCCCCC[N+](C)(C)Cc1ccccc1.Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.65

Known targets — ChEMBL curated mechanism

ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 2/20 0.65
MEN1 O00255 2/20 0.63
KMT2A Q03164 2/20 0.63
MAPK1 P28482 2/20 0.63
SMN1; SMN2 Q16637 2/20 0.63
TP53 P04637 1/20 0.63
HTT P42858 4/20 0.62
PSMD14 O00487 1/20 0.47
HSP90AA1 P07900 1/20 0.47
MMP2 P08253 1/20 0.47
MC4R P32245 1/20 0.47
RAD52 P43351 1/20 0.47
CNR2 P34972 2/20 0.43
KCNH2 Q12809 2/20 0.41
LMNA P02545 2/20 0.41
HIF1A Q16665 2/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
TSHR P16473 1/20 0.41
CYP2C19 P33261 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2150486 1.00 DNM1 (0.65) DNM1MEN1KMT2AMAPK1SMN1; SMN2
Benzododecinium SCHEMBL2149522 1.00 DNM1 (0.65) DNM1MEN1KMT2AMAPK1SMN1; SMN2
Benzododecinium SCHEMBL330680 0.92 DNM1 (0.72) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL331114 0.92 DNM1 (0.72) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL332022 0.92 DNM1 (0.72) DNM1MEN1KMT2AMAPK1SMN1; SMN2
Cetalkonium SCHEMBL27537726 0.91 DNM1 (0.70) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL9495788 0.89 DNM1 (0.49) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL11134792 0.89 CNR2 (0.50) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL9494532 0.89 DNM1 (0.63) DNM1MEN1KMT2AMAPK1SMN1; SMN2
SCHEMBL331209 0.89 DNM1 (0.67) DNM1MEN1KMT2AMAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0315084-B1 METHOD FOR INCREASING THE ELECTROSTATIC CHARGEABILITY OF POWDER VARNISHES OR POWDERS, AND THEIR USE IN THE SURFACE COATING OF SOLID OBJECTS HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-09 EP claimed
US-9290656-B2 Polymerizable composition for polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2016-03-22 US disclosed
EP-2341091-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND METHOD FOR PREPARING THE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2013-12-04 EP disclosed
EP-1988109-B1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2013-05-29 EP disclosed
US-8434866-B2 Polymerizable composition for optical material, optical material, and method for preparing the optical material MITSUI CHEMICALS, INC. (JP) 2013-05-07 US disclosed
US-20110190466-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-08-04 US disclosed
EP-2341091-A1 POLYMERIZABLE COMPOUND FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND OPTICAL MATERIAL MANUFACTURING METHOD Mitsui Chemicals, Inc. (JP) 2011-07-06 EP disclosed
US-20100075154-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND METHOD FOR PREPARING THE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2010-03-25 US disclosed
EP-1988109-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2008-11-05 EP disclosed
US-5723250-A Process for image formation using liquid developer FUJI XEROX CO., LTD. (JP) 1998-03-03 US disclosed
US-5622804-A COMPOSITION INCLUDING CARRIER COMPRISING ETHER COMPOUND, CHARGE DIRECTOR, DISPERSED TONER PARTICLES COMPRISING INSOLUBLE THERMOPLASTIC RESIN, COLORANT, CHARGE CONTROL AGENT FUJI XEROX CO., LTD. (JP) 1997-04-22 US disclosed
EP-0321363-B1 NEW ELECTROSTATOGRAPHIC TONERS AND DEVELOPERS CONTAINING NEW CHARGE-CONTROL AGENTS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1993-03-31 EP disclosed
US-5198320-A Polymers with oxygen linkages polysiloxanes EASTMAN KODAK COMPANY (US) 1993-03-30 US disclosed
US-4851561-A CHARGE CONTROL AGENTS FOR ELECTROSTATOGRAPHY EASTMAN KODAK COMPANY (US) 1989-07-25 US disclosed
EP-0321363-A2 New electrostatographic toners and developers containing new charge-control agents EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-06-21 EP disclosed