SCHEMBL21496079

SCHEMBL21496079

CCCCCCC=COCC(C)(C)O[SiH3]

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 4/20 0.37
TRPV1 Q8NER1 1/20 0.37
BLM P54132 3/20 0.35
HSD17B10 Q99714 3/20 0.35
GMNN O75496 2/20 0.35
USP2 O75604 2/20 0.35
CYP1A2 P05177 2/20 0.35
POLB P06746 2/20 0.35
CYP2C9 P11712 2/20 0.35
APEX1 P27695 2/20 0.35
CYP2C19 P33261 2/20 0.35
RECQL P46063 2/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
TERT O14746 3/20 0.33
MAPT P10636 2/20 0.33
FABP4 P15090 2/20 0.33
PTPN1 P18031 2/20 0.33
PPARG P37231 2/20 0.33
PPARD Q03181 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21496074 1.00 FAAH (0.37) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL21496041 1.00 FAAH (0.37) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL21496043 1.00 FAAH (0.37) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL21496089 0.93
SCHEMBL21496084 0.93
SCHEMBL23000340 0.83 FAAH (0.35) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL23000336 0.83 FAAH (0.35) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL29121046 0.77 FAAH (0.45) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL29121042 0.77 FAAH (0.45) FAAHTRPV1BLMHSD17B10GMNN
SCHEMBL29038223 0.77 FAAH (0.43) FAAHTRPV1BLMHSD17B10GMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3783037-B1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHINETSU CHEMICAL CO (JP) 2024-01-10 EP disclosed
CN-111989348-B Polymer having reactive silicon-containing group and method for producing same 信越化学工业株式会社 2023-10-20 CN disclosed
US-11667790-B2 Polymer having reactive silicon-containing group and production method therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-06 US disclosed
US-20210155800-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-27 US disclosed
EP-3783037-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2021-02-24 EP disclosed
WO-2019202796-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR 信越化学工業株式会社 2019-10-24 WO disclosed