SCHEMBL23000336

SCHEMBL23000336

CCCCCCCCCC=COCCC(C)(C)O[SiH3]

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FAAH O00519 2/20 0.35
TRPV1 Q8NER1 1/20 0.35
LPAR3 Q9UBY5 2/20 0.35
LPAR1 Q92633 1/20 0.35
LPAR2 Q9HBW0 1/20 0.35
GMNN O75496 1/20 0.33
USP2 O75604 1/20 0.33
CYP1A2 P05177 1/20 0.33
POLB P06746 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
APEX1 P27695 1/20 0.33
CYP2C19 P33261 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23000340 1.00 FAAH (0.35) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL21496088 0.93 LPAR2 (0.30) LPAR3LPAR1LPAR2
SCHEMBL21496041 0.83 FAAH (0.37) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL21496043 0.83 FAAH (0.37) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL21496079 0.83 FAAH (0.37) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL21496074 0.83 FAAH (0.37) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL29121042 0.81 FAAH (0.45) FAAHTRPV1GMNNUSP2CYP1A2
SCHEMBL29121021 0.81 FAAH (0.45) FAAHTRPV1GMNNUSP2CYP1A2
SCHEMBL25275490 0.77 LPAR2 (0.48) FAAHTRPV1LPAR3LPAR1LPAR2
SCHEMBL25229428 0.77 LPAR2 (0.48) FAAHTRPV1LPAR3LPAR1LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3783037-B1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHINETSU CHEMICAL CO (JP) 2024-01-10 EP disclosed
CN-111989348-B Polymer having reactive silicon-containing group and method for producing same 信越化学工业株式会社 2023-10-20 CN disclosed
US-11667790-B2 Polymer having reactive silicon-containing group and production method therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-06 US disclosed
US-20210155800-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-27 US disclosed
EP-3783037-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2021-02-24 EP disclosed