SCHEMBL214978

SCHEMBL214978

CCCC(=O)OOCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5902744 0.97 ALDH1A1 (0.52)
SCHEMBL6258447 0.89 TSHR (0.43)
SCHEMBL27304214 0.89 ALDH1A1 (0.44)
SCHEMBL445303 0.85 CES1 (0.46)
SCHEMBL31426278 0.84 DGKA (0.43)
SCHEMBL28188499 0.84 TSHR (0.43)
SCHEMBL445924 0.83 DGKA (0.54)
SCHEMBL297885 0.83 ALDH1A1 (0.67)
SCHEMBL27982744 0.81 DGKA (0.57)
SCHEMBL27983159 0.81 DGKA (0.57)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2964 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240191056-A1 ZIRCONIA AND TITANIA FORMULATIONS AND NANOCOMPOSITES FOR NANOIMPRINT LITHOGRAPHY PT SPE SUBCO LLC 2024-06-13 US claimed
EP-4314146-A1 ZIRCONIA AND TITANIA FORMULATIONS AND NANOCOMPOSITES FOR NANOIMPRINT LITHOGRAPHY PT SPE SubCo LLC (US) 2024-02-07 EP claimed
EP-3676311-B1 NOVEL (PER)FLUOROPOLYETHER POLYMERS AND USE THEREOF SOLVAY SPECIALTY POLYMERS IT (IT) 2023-10-18 EP claimed
WO-2023143741-A1 NEW COOLANTS, AND PREPARATIONS CONTAINING SAME SYMRISE AG (DE) 2023-08-03 WO claimed
WO-2023144326-A1 NEW COOLANTS, AND PREPARATIONS CONTAINING SAME SYMRISE AG (DE) 2023-08-03 WO claimed
US-11034845-B2 Nanocomposite formulations for optical applications PIXELLIGENT TECHNOLOGIES, LLC (US) 2021-06-15 US claimed
CN-110032042-A Negative photoresist composition and its application method for laser ablation AZ电子材料卢森堡有限公司 2019-07-19 CN claimed
CN-104536263-B Photosensitive resin composition for black matrix 株式会社LG化学 2019-06-21 CN claimed
CN-109776436-A A kind of preparation method of triazole class compounds 帕潘纳(北京)科技有限公司 2019-05-21 CN claimed
CN-109564388-A Composition is used in the formation of lower layer's anti-reflective film AZ电子材料(卢森堡)有限公司 2019-04-02 CN claimed
WO-1995033777-A1 USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS W.R. GRACE & CO.-CONN. (US) 1995-12-14 WO claimed
EP-0418313-A4 CIRCUIT WRITER 1992-01-15 EP claimed
CN-1051360-A Have agaist allergic symptoms and the active new tetracyclic compound of anti-asthma, its preparation and application SANKYO CO (JP) 1991-05-15 CN claimed
EP-0418313-A1 CIRCUIT WRITER SOPHIA SYSTEMS Co., Ltd. (JP) 1991-03-27 EP claimed
US-4921934-A AUTOPOLYMERIZATION, AGRAFT POLYMER OF UNSATURATED CARBOXYLIC ACID WITH POLYLACTONE S. C. JOHNSON & SON, INC. (US) 1990-05-01 US claimed
WO-1989011209-A1 CIRCUIT WRITER ARIEL ELECTRONICS, INC. (US) 1989-11-16 WO claimed
US-4618635-A RADIATION CURABLE; HIGH TENSILE STRENGTH UNION CARBIDE CORPORATION (US) 1986-10-21 US claimed
US-4585702-A CURED POLYMERIC BINDER COMPRISING LACTONE-ACRYLATE ADDUCT UNION CARBIDE CORPORATION (US) 1986-04-29 US claimed
EP-0133908-A2 Compositions useful in curable coatings UNION CARBIDE CORPORATION (US) 1985-03-13 EP claimed
US-4111928-A METHOD OF SEPARATING LIGNIN AND MAKING EPOXIDE-LIGNIN HOLSOPPLE DALE B 1978-09-05 US claimed