Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PCNA | P12004 | 13/20 | 0.57 |
| ▸ | LIG1 | P18858 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.52 |
| ▸ | ESR1 | P03372 | 1/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.52 |
| ▸ | LTA4H | P09960 | 2/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.45 |
| ▸ | BAX | Q07812 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25773017 | 0.84 | PCNA (0.54) | PCNALIG1MEN1KMT2AESR1 | |
| SCHEMBL16124480 | 0.81 | PCNA (0.63) | PCNALIG1 | |
| SCHEMBL4005004 | 0.81 | PCNA (0.66) | PCNALIG1 | |
| SCHEMBL4008454 | 0.80 | PCNA (0.61) | PCNALIG1 | |
| SCHEMBL14485265 | 0.80 | PCNA (0.64) | PCNALIG1 | |
| SCHEMBL24414010 | 0.78 | MEN1 (0.64) | MEN1KMT2AESR1ESR2LTA4H | |
| SCHEMBL24021497 | 0.78 | PCNA (0.38) | PCNALIG1MEN1KMT2A | |
| SCHEMBL24413695 | 0.77 | TPMT (0.50) | PCNAKMT2A | |
| SCHEMBL14264010 | 0.77 | PCNA (0.67) | PCNALIG1 | |
| SCHEMBL22382794 | 0.77 | PCNA (0.67) | PCNALIG1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220146930-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11156916-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-26 | — | — | US | disclosed |
| US-20190324368-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220146930-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FGFR1, NHERF1 | PCNA 1880/4885LIG1 3140/4885MEN1 2209/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.