⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL10734038 | 0.82 | ALDH1A1 (0.37) | — | |
| Bicarbonate SCHEMBL10734019 | 0.82 | ALDH1A1 (0.37) | — | |
| Sulfuric Acid SCHEMBL7627413 | 0.79 | CA5A (0.38) | — | |
| Oxalic Acid SCHEMBL10733835 | 0.79 | ALDH1A1 (0.35) | — | |
| Oxalic Acid SCHEMBL10733846 | 0.79 | ALDH1A1 (0.35) | — | |
| SCHEMBL9660833 | 0.70 | — | — | |
| SCHEMBL7153696 | 0.67 | — | — | |
| SCHEMBL12156692 | 0.65 | — | — | |
| SCHEMBL3230287 | 0.64 | — | — | |
| SCHEMBL15763355 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180155827-A1 | Synthesis of Metal Nitride Thin Films Materials using Hydrazine Derivatives | APPLIED MATERIALS, INC. | 2018-06-07 | — | — | US | claimed |
| US-12622232-B2 | Advanced self aligned multiple patterning using tin oxide | LAM RESEARCH CORPORATION (US) | 2026-05-05 | — | — | US | disclosed |
| US-20260090293-A1 | SEMICONDUCTOR STACKS AND PROCESSES THEREOF | LAM RES CORP (US) | 2026-03-26 | — | — | US | disclosed |
| US-12588475-B2 | High selectivity doped hardmask films | LAM RESEARCH CORPORATION (US) | 2026-03-24 | — | — | US | disclosed |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| US-20260047361-A1 | METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING MULTIPLE CHAMBERS | NATIONAL TSING HUA UNIVERSITY (TW) | 2026-02-12 | — | — | US | disclosed |
| EP-4651192-A2 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | Lam Research Corporation (US) | 2025-11-19 | — | — | EP | disclosed |
| US-12474638-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-20250328076-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RES CORP (US) | 2025-10-23 | — | — | US | disclosed |
| US-20250283221-A1 | CARRIER RING WITH TABS | LAM RES CORP (US) | 2025-09-11 | — | — | US | disclosed |
| WO-2008077020-A2 | SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BORON IMPLANTED WAFERS | APPLIED MATERIALS, INC. (US) | 2008-06-26 | — | — | WO | disclosed |
| WO-2007131040-A2 | METHOD AND APPARATUS FOR PHOTO-EXCITATION OF CHEMICALS FOR ATOMIC LAYER DEPOSITION OF DIELECTRIC FILM | APPLIED MATERIALS, INC. (US) | 2007-11-15 | — | — | WO | disclosed |
| US-20070259111-A1 | METHOD AND APPARATUS FOR PHOTO-EXCITATION OF CHEMICALS FOR ATOMIC LAYER DEPOSITION OF DIELECTRIC FILM | APPLIED MATERIALS, INC. | 2007-11-08 | — | — | US | disclosed |
| WO-2007002040-A2 | METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS | APPLIED MATERIALS, INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| US-20060286774-A1 | METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS | APPLIED MATERIALS. INC. | 2006-12-21 | — | — | US | disclosed |
| US-20060286775-A1 | METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS | APPLIED MATERIALS, INC. | 2006-12-21 | — | — | US | disclosed |
| US-20060286776-A1 | METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS | APPLIED MATERIALS, INC. | 2006-12-21 | — | — | US | disclosed |
| EP-0216990-A2 | Foaming and vulcanizing of elastomeric polymers | PENNWALT CORPORATION (US) | 1987-04-08 | — | — | EP | disclosed |
| US-4268486-A | REACTING WITH A HYDRAZINE COMPOUND AND SEPARATING TRIVALENT CHROMIUM COMPOUNDS | OLIN CORPORATION (US) | 1981-05-19 | — | — | US | disclosed |
| US-3962113-A | METHOD FOR ACCELERATING OXYGEN REMOVAL EMPLOYING AN AQUEOUS SOLUTION OF AN ALKYL HYDRAZINE | OLIN CORPORATION (US) | 1976-06-08 | — | — | US | disclosed |