Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 5/20 | 0.41 |
| ▸ | HTT | P42858 | 4/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | RAD52 | P43351 | 1/20 | 0.40 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL214045 | 0.89 | ALDH1A1 (0.45) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL5824224 | 0.80 | ALDH1A1 (0.54) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL5824294 | 0.80 | ALDH1A1 (0.54) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL7688059 | 0.80 | ALDH1A1 (0.56) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL28994949 | 0.75 | ALDH1A1 (0.43) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL7689239 | 0.74 | KMT2A (0.49) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL7686932 | 0.74 | KMT2A (0.49) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL213172 | 0.73 | TSHR (0.34) | KMT2AMEN1 | |
| SCHEMBL28007809 | 0.73 | LMNA (0.60) | KMT2AKDM4EALDH1A1LMNAHTT | |
| SCHEMBL75298 | 0.72 | ALDH1A1 (0.55) | KMT2AKDM4EALDH1A1LMNAHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230364928-A1 | INKJET INK, METHOD FOR MANUFACTURING PRINTED MATERIAL, AND PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20220389268-A1 | INK-JET APPLICATION TYPE COMPOSITION FOR WIRING-LINE PROTECTION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING SAME, AND SEMICONDUCTOR DEVICE | MITSUI CHEMICALS, INC. (JP) | 2022-12-08 | — | — | US | disclosed |
| US-20220186066-A1 | PROTECTION MEMBER FOR SEMICONDUCTOR, PROTECTION COMPOSITION FOR INKJET COATING-TYPE SEMICONDUCTOR, AND METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS USING SAME, AND SEMICONDUCTOR APPARATUS | MITSUI CHEMICALS, INC. (JP) | 2022-06-16 | — | — | US | disclosed |
| EP-3885399-A1 | CURABLE COMPOSITION FOR MECHANICAL FOAMING, AND METHOD FOR MANUFACTURING FOAM OF SAME | ThreeBond Co., Ltd. (JP) | 2021-09-29 | — | — | EP | disclosed |
| US-20210237484-A1 | METHOD FOR PRODUCING INKJET PRINTED MATERIAL AND INKJET PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2021-08-05 | — | — | US | disclosed |
| US-10982120-B2 | Thermocurable electroconductive adhesive | THREEBOND CO., LTD. (JP) | 2021-04-20 | — | — | US | disclosed |
| EP-3199520-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-25 | — | — | EP | disclosed |
| US-10386721-B2 | Pattern formation method and electronic device manufactured using same | ADEKA CORPORATION (JP) | 2019-08-20 | — | — | US | disclosed |
| EP-3272737-B1 | SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORP (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2524914-B1 | SULFONIC ACID DERIVATIVE COMPOUND AND NAPHTHALIC ACID DERIVATIVE COMPOUND | ADEKA CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| WO-2006098676-A1 | ULTRAVIOLET CURING RESIN COMPOSITION | PERSTORP SPECIALTY CHEMICALS AB (SE) | 2006-09-21 | — | — | WO | disclosed |
| US-20060194029-A1 | Ink composition, inkjet recording method using the same, and printed material | FUJI PHOTO FILM CO., LTD. | 2006-08-31 | — | — | US | disclosed |
| US-20060171627-A1 | Optical device and method for producing the same | BRIDGESTONE CORPORATION | 2006-08-03 | — | — | US | disclosed |
| US-20050287470-A1 | Curable compositions and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2005-12-29 | — | — | US | disclosed |
| US-20050171255-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-6866376-B2 | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2005-03-15 | — | — | US | disclosed |
| US-6805439-B2 | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2004-10-19 | — | — | US | disclosed |
| US-6586496-B1 | Composition comprising compound having at least one oxetane ring, photoinitiator for cationic polymerization, silane coupling agent, microparticulate inorganic filler, and compound having epoxy group, having specified viscosity | MITSUI CHEMICALS, INC. (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20030112307-A1 | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20020132872-A1 | Resin composition for photofabrication of three dimensional objects | DSM IP ASSETS B.V. (NL) | 2002-09-19 | — | — | US | disclosed |