SCHEMBL215805

SCHEMBL215805

C=Cc1ccc2c(CCCC)ccc(Br)c2c1

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TYR P14679 2/20 0.35
ALDH1A1 P00352 1/20 0.31
GAA P10253 1/20 0.31
ERAP1 Q9NZ08 1/20 0.31
MEN1 O00255 1/20 0.30
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30
ALOX5 P09917 1/20 0.30
MAPT P10636 1/20 0.30
ALOX15 P16050 1/20 0.30
TSHR P16473 1/20 0.30
HTT P42858 1/20 0.30
KMT2A Q03164 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL214651 0.84 ESR1 (0.35) ALDH1A1TP53TDP1
SCHEMBL12802008 0.77 TYR (0.43) TYRALDH1A1MEN1TP53CYP3A4
SCHEMBL31335110 0.77 ALDH1A1 (0.43) ALDH1A1TP53MAPTTSHRTDP1
SCHEMBL214636 0.77 ALDH1A1 (0.43) ALDH1A1TP53MAPTTSHRTDP1
SCHEMBL11794575 0.74 CNR2 (0.42) TYRALDH1A1GAA
SCHEMBL29263436 0.73 TYR (0.61) TYRALDH1A1GAAMEN1TP53
SCHEMBL27699486 0.73 TYR (0.43) TYRALDH1A1MEN1TP53CYP3A4
SCHEMBL5672187 0.73 ALDH1A1 (0.36) ALDH1A1TP53MAPTTDP1
SCHEMBL12802596 0.73 TYR (0.43) TYRALDH1A1MEN1TP53CYP3A4
SCHEMBL215089 0.73 TP53 (0.38) ALDH1A1TP53MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780600-B1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM NISSAN CHEMICAL IND LTD (JP) 2014-02-26 EP disclosed
US-8088546-B2 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-01-03 US disclosed
CN-1977220-B Lower layer film forming composition for lithography including naphthalene ring having halogen atom NISSAN CHEMICAL IND LTD 2010-12-01 CN disclosed
US-20070238029-A1 Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-11 US disclosed
EP-1780600-A1 LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM Nissan Chemical Industries, Ltd. (JP) 2007-05-02 EP disclosed