⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL167374 | 0.97 | — | — | |
| SCHEMBL6946803 | 0.97 | — | — | |
| SCHEMBL29034419 | 0.94 | ALDH1A1 (0.40) | — | |
| SCHEMBL1961611 | 0.94 | — | — | |
| SCHEMBL29116197 | 0.94 | — | — | |
| SCHEMBL1959272 | 0.94 | — | — | |
| SCHEMBL1962788 | 0.94 | — | — | |
| SCHEMBL29116204 | 0.94 | — | — | |
| Formamide SCHEMBL716210 | 0.87 | ALDH1A1 (0.35) | — | |
| SCHEMBL28269767 | 0.87 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106674061-A | Method for preparing N-ammonium methyl taurine and N-sodium methyl taurine | 廖立新 | 2017-05-17 | — | — | CN | claimed |
| CN-109937187-B | Cerium oxide-based composite microparticle dispersion, method for producing same, and abrasive particle dispersion for polishing containing cerium oxide-based composite microparticle dispersion | 日挥触媒化成株式会社 | 2022-08-09 | — | — | CN | disclosed |
| US-11267715-B2 | Ceria-based composite fine particle dispersion, production method therefor, and polishing abrasive grain dispersion including ceria-based composite fine particle dispersion | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2022-03-08 | — | — | US | disclosed |
| CN-110177852-B | Polishing composition | 日挥触媒化成株式会社 | 2021-12-14 | — | — | CN | disclosed |
| CN-107428544-B | Silica-based composite fine particle dispersion, method for producing same, and polishing slurry containing silica-based composite fine particle dispersion | 日挥触媒化成株式会社 | 2020-12-04 | — | — | CN | disclosed |
| EP-3632848-A1 | CERIA-BASED COMPOSITE FINE PARTICLE DISPERSION, PRODUCTION METHOD THEREFOR, AND POLISHING ABRASIVE GRAIN DISPERSION INCLUDING CERIA-BASED COMPOSITE FINE PARTICLE DISPERSION | JGC Catalysts and Chemicals Ltd. (JP) | 2020-04-08 | — | — | EP | disclosed |
| US-20200087554-A1 | Ceria-Based Composite Fine Particle Dispersion, Production Method Therefor, and Polishing Abrasive Grain Dispersion Including Ceria-Based Composite Fine Particle Dispersion | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2020-03-19 | — | — | US | disclosed |
| CN-106588710-B | A kind of method of applied microwave synthesis N- acyl-N-methyl taurates | 湖北远大生命科学与技术有限责任公司 | 2018-07-10 | — | — | CN | disclosed |
| CN-106674061-A | Method for preparing N-ammonium methyl taurine and N-sodium methyl taurine | 廖立新 | 2017-05-17 | — | — | CN | disclosed |
| CN-106588710-A | Method for synthesizing N-acyl-N-methyl taurine salt through microwave | 黄冈市富驰制药有限责任公司 | 2017-04-26 | — | — | CN | disclosed |
| US-20080121840-A1 | mixing oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1833085-A1 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2007-09-12 | — | — | EP | disclosed |
| US-7250369-B1 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | HITACHI, LTD. (JP) | 2007-07-31 | — | — | US | disclosed |
| US-20070167017-A1 | a mixture of oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors | RENESAS ELECTRONICS CORPORATION (JP) | 2007-07-19 | — | — | US | disclosed |
| CN-1295211-C | Process for producing aminoalkylsulfonic acid and method of salt exchange for salt thereof | WAKO PURE CHEM IND LTD (JP) | 2007-01-17 | — | — | CN | disclosed |
| US-20060216939-A1 | a mixture of oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors | RENESAS ELECTRONICS CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060214133-A1 | Metal polishing solution and polishing method | FUJI PHOTO FILM CO., LTD. | 2006-09-28 | — | — | US | disclosed |
| EP-1702965-A2 | Metal chemical mechanical polishing solution and polishing method | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-20 | — | — | EP | disclosed |
| CN-1678574-A | Process for producing aminoalkylsulfonic acid and method of salt exchange for salt thereof | WAKO PURE CHEM IND LTD (JP) | 2005-10-05 | — | — | CN | disclosed |
| EP-1150341-A1 | MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-10-31 | — | — | EP | disclosed |