SCHEMBL2160225

SCHEMBL2160225

CC(COc1ccccc1)OCC(C)OS(=O)(=O)O

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.49
MTNR1A P48039 3/20 0.44
MTNR1B P49286 3/20 0.44
MAOA P21397 1/20 0.41
PTGS1 P23219 1/20 0.41
CYP2D6 P10635 2/20 0.41
ADRB2 P07550 2/20 0.41
ADRB1 P08588 2/20 0.41
ADRB3 P13945 2/20 0.41
KAT6A Q92794 1/20 0.38
ABCB1 P08183 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
SCN4A P35499 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2160496 0.94 LMNA (0.55) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL4851435 0.79 LMNA (0.52) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL1001111 0.79 LMNA (0.72) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL970564 0.79 LMNA (0.72) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL11654360 0.78 TDP1 (0.45) LMNAMAOAADRB2ADRB1ADRB3
SCHEMBL9451349 0.78 LMNA (0.50) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL22367716 0.77 LMNA (0.53) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL872625 0.77 LMNA (0.75) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL31310684 0.77 LMNA (0.53) LMNAMTNR1AMTNR1BMAOAPTGS1
SCHEMBL5727400 0.77 LMNA (0.53) LMNAMTNR1AMTNR1BMAOAPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8703007-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2014-04-22 US disclosed
US-20110180511-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2011-07-28 US disclosed
EP-2348080-A1 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2011-07-27 EP disclosed