Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28248004 | 0.88 | ALDH1A1 (0.46) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| SCHEMBL329257 | 0.86 | TSHR (0.54) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL3673686 | 0.84 | TSHR (0.52) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Etoglucid SCHEMBL9856393 | 0.82 | ALDH1A1 (0.50) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL8503716 | 0.82 | ALDH1A1 (0.50) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL5014743 | 0.81 | TSHR (0.64) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL23458826 | 0.81 | ALDH1A1 (0.55) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL237309 | 0.81 | ALDH1A1 (0.55) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL865515 | 0.80 | TSHR (0.62) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Acrylic Acid SCHEMBL6328754 | 0.79 | ALDH1A1 (0.50) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020027024-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PLATING METHOD, AND METHOD FOR PRODUCING METAL PATTERN | 三菱製紙株式会社 | 2020-02-06 | — | — | WO | disclosed |