Acrylic Acid

Acrylic Acid

SCHEMBL237309

C(OCC1CO1)C1CO1.C=CC(=O)O

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.55
TSHR P16473 2/20 0.45
LMNA P02545 1/20 0.42
MAPK1 P28482 1/20 0.41
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
TDP1 Q9NUW8 2/20 0.37
MGLL Q99685 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL23458826 1.00 ALDH1A1 (0.55) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL28292253 0.98 ALDH1A1 (0.53) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL26092369 0.98 ALDH1A1 (0.53) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL238972 0.96 ALDH1A1 (0.52) ALDH1A1TSHRLMNAMAPK1TP53
Benzene SCHEMBL1344847 0.96 ALDH1A1 (0.52) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL27885567 0.94 ALDH1A1 (0.50) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL6328754 0.94 ALDH1A1 (0.50) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL28931460 0.93 ALDH1A1 (0.53) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL28460047 0.93 ALDH1A1 (0.48) ALDH1A1TSHRLMNAMAPK1TP53
Acrylic Acid SCHEMBL3797727 0.93 ALDH1A1 (0.48) ALDH1A1TSHRLMNAMAPK1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1695 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250388769-A1 Ink Composition, Package Structure and Semiconductor Device HANGZHOU FIRST APPLIED MAT CO LTD (CN) 2025-12-25 US claimed
CN-118459941-B Solid epoxy vinyl ester resin composition and preparation method and application thereof 华东理工大学华昌聚合物有限公司 2025-05-23 CN claimed
EP-4530321-A1 INK COMPOSITION, PACKAGING STRUCTURE, AND SEMICONDUCTOR DEVICE Hangzhou First Applied Material Co., Ltd. (CN) 2025-04-02 EP claimed
US-12264120-B2 Amine synergists with UV—a absorption SUN CHEMICAL CORPORATION (US) 2025-04-01 US claimed
CN-118085798-B UV insulation protection adhesive for new energy battery and preparation method thereof 东莞市高图新材料有限公司 2025-03-25 CN claimed
CN-119463681-A Isocyanate-resistant release coating formula, pattern heat transfer paper and manufacturing method and application thereof 浙江凯伦特种材料有限公司 2025-02-18 CN claimed
CN-119350688-A Stain-resistant scratch-resistant decorative mask and preparation method and application thereof 浙江锦盛装饰材料股份有限公司 2025-01-24 CN claimed
CN-115073513-B Compound for packaging film, composition, packaging film and semiconductor device 吉林奥来德光电材料股份有限公司 2024-12-13 CN claimed
EP-4301725-B1 AMINE SYNERGISTS WITH UV-A ABSORPTION SUN CHEMICAL CORP (US) 2024-08-21 EP claimed
US-20240270678-A1 AMINE SYNERGISTS WITH UV-A ABSORPTION SUN CHEMICAL CORPORATION (US) 2024-08-15 US claimed
US-20070243363-A1 Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods LG CHEM, LTD. (KR) 2007-10-18 US claimed
CN-101020601-A Poured epoxytar concrete material and its prepn process ZHIXIANG ROAD PAVEMENT TECHN E (CN) 2007-08-22 CN claimed
CN-101018835-A Coating composition for film with low refractive index and film prepared therefrom LG CHEMICAL LTD (KR) 2007-08-15 CN claimed
CN-1885163-A Negative resist composition ADMS TECHNOLOGY CO LTD (KR) 2006-12-27 CN claimed
CN-1781057-A Negative resist composition for organic insulating layer of high aperture LCD ADMS TECHNOLOGY CO LTD (KR) 2006-05-31 CN claimed
WO-2004107052-A1 NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING ADMS TECHNOLOGY CO., LTD. (KR) 2004-12-09 WO claimed
WO-2004097522-A1 NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD ADMS TECHNOLOGY CO. LTD. (KR) 2004-11-11 WO claimed
US-5185238-A Protective coating layer of a radiation-cured acrylated polyurethane and pentaerythritol polyacrylate; spools or cartridges for cameras; color films FUJI PHOTO FILM CO., LTD. (JP) 1993-02-09 US claimed
US-4677449-A BINDER-FIXED MICROCAPSULES HAVING A MAJORITY OF THEIR SURFACE S EXPOSED OUTSIDE THE BINDER KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1987-06-30 US claimed
US-4597993-A Partially pressure-sensitized recording paper and process for preparing the same KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-07-01 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12264120-B2 Amine synergists with UV—a absorption OR51E2, PNMT, ALDH7A1 ALDH1A1 11/4885TSHR 4470/4885LMNA 2858/4885
US-20240270678-A1 AMINE SYNERGISTS WITH UV-A ABSORPTION ALDH7A1, PNMT, OR51E2 ALDH1A1 8/4885TSHR 4384/4885LMNA 2210/4885
US-20250388769-A1 Ink Composition, Package Structure and Semiconductor Device ASH2L, INO80C, CCNL2 ALDH1A1 1742/4885TSHR 4295/4885LMNA 2409/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.