Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.48 |
| ▸ | MGAM | O43451 | 1/20 | 0.48 |
| ▸ | SI | P14410 | 1/20 | 0.48 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15902482 | 0.92 | GAA (0.52) | GAAMGAMSIMGAM2TSHR | |
| SCHEMBL107227 | 0.85 | — | — | |
| Ethyl Propionate SCHEMBL28111792 | 0.85 | GAA (0.52) | GAAMGAMSIMGAM2TSHR | |
| SCHEMBL28097115 | 0.85 | GAA (0.50) | GAAMGAMSIMGAM2TSHR | |
| SCHEMBL28182128 | 0.85 | GAA (0.50) | GAAMGAMSIMGAM2TSHR | |
| Ethyl Acetate SCHEMBL28188604 | 0.84 | ALDH1A1 (0.56) | GAAMGAMSIMGAM2TSHR | |
| Ethyl Propionate SCHEMBL1865844 | 0.83 | ALDH1A1 (0.52) | GAAMGAMSIMGAM2TSHR | |
| SCHEMBL15945455 | 0.83 | TSHR (0.55) | GAAMGAMSIMGAM2TSHR | |
| Ethyl Propionate SCHEMBL10714742 | 0.83 | GAA (0.62) | GAAMGAMSIMGAM2TSHR | |
| Propane SCHEMBL8063536 | 0.83 | TSHR (0.60) | GAAMGAMSIMGAM2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020027206-A1 | OPTICAL COMPONENT-FORMING COMPOSITION, OPTICAL COMPONENT, COMPOUND, AND RESIN | 三菱瓦斯化学株式会社 | 2020-02-06 | — | — | WO | disclosed |
| CN-109803950-A | Compound, resin and composition and corrosion-resisting pattern forming method and circuit pattern forming method | 三菱瓦斯化学株式会社 | 2019-05-24 | — | — | CN | disclosed |
| CN-109790097-A | Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method | 三菱瓦斯化学株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-109790175-A | Compound, resin, composition and corrosion-resisting pattern forming method and pattern forming method | 三菱瓦斯化学株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-109715591-A | Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method | 三菱瓦斯化学株式会社 | 2019-05-03 | — | — | CN | disclosed |
| CN-109082138-A | Pigment dispersion and coloured composition comprising the pigment dispersion | 山阳色素株式会社 | 2018-12-25 | — | — | CN | disclosed |
| CN-109073782-A | Optical element forms composition and its solidfied material | 三菱瓦斯化学株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-103733135-B | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | 三菱瓦斯化学株式会社 | 2018-11-27 | — | — | CN | disclosed |
| CN-107848946-A | New (methyl) acryl compound and its manufacture method | 三菱瓦斯化学株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-107430337-A | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107428717-A | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107430338-A | RADIATION-SENSITIVE COMPOSITION | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107407874-A | Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106957217-A | Polyphenol compound for anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2017-07-18 | — | — | CN | disclosed |
| CN-106462059-A | Resist material, resist composition, and resist pattern formation method | 三菱瓦斯化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-103946204-B | Cyclic compound, its manufacture method, radiation-sensitive composition and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2016-08-24 | — | — | CN | disclosed |