⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22812880 | 0.62 | — | — | |
| SCHEMBL19314109 | 0.60 | — | — | |
| SCHEMBL15460010 | 0.57 | — | — | |
| SCHEMBL20780690 | 0.55 | — | — | |
| SCHEMBL18943616 | 0.51 | — | — | |
| SCHEMBL17226950 | 0.51 | — | — | |
| SCHEMBL250889 | 0.51 | — | — | |
| SCHEMBL18169663 | 0.47 | — | — | |
| SCHEMBL1740865 | 0.45 | — | — | |
| SCHEMBL1445441 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3604390-A1 | POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIMIDE, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, PHOTOSENSITIVE DRY FILM, AND PROTECTIVE FILM FOR ELECTRIC AND ELECTRONIC PARTS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-02-05 | — | — | EP | disclosed |