SCHEMBL21705269

SCHEMBL21705269

O=C(OCCN(CCOC(=O)c1c(I)ccc(I)c1I)CCOC(=O)c1c(I)ccc(I)c1I)c1c(I)ccc(I)c1I

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 4/20 0.40
▸ TSHR P16473 3/20 0.40
▸ MAOA P21397 2/20 0.40
▸ HTR3A P46098 2/20 0.40
▸ HRH3 Q9Y5N1 2/20 0.40
▸ BLM P54132 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ SCN1A P35498 4/20 0.38
▸ SCN2A Q99250 4/20 0.38
▸ SCN3A Q9NY46 4/20 0.38
▸ LMNA P02545 4/20 0.38
▸ ATM Q13315 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ PHLPP2 Q6ZVD8 1/20 0.35
▸ CHRM2 P08172 2/20 0.35
▸ KCNH2 Q12809 2/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ CHRM3 P20309 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21783811 0.92 CYP2D6 (0.37) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705721 0.87 PHLPP2 (0.50) MAOAHRH3BLMSCN1ASCN2A
SCHEMBL21705270 0.85 TSHR (0.39) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705704 0.83 SMN1; SMN2 (0.40) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705750 0.79 SCN1A (0.40) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705272 0.79 HDAC3 (0.34) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705267 0.79 HTR3A (0.43) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL22097580 0.78 TSHR (0.36) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705711 0.72 PHLPP2 (0.49) MAOAHRH3BLMSCN1ASCN2A
SCHEMBL21500917 0.71 KMT2A (0.56) TSHRLMNAMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR CYP2D6 3435/4885TSHR 969/4885MAOA 1740/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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