SCHEMBL21783811

SCHEMBL21783811

O=C(OCCN(CCOC(=O)c1c(I)ccc(I)c1I)COC(=O)c1c(I)ccc(I)c1I)c1c(I)ccc(I)c1I

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 4/20 0.37
▸ TSHR P16473 3/20 0.37
▸ MAOA P21397 2/20 0.37
▸ HTR3A P46098 2/20 0.37
▸ HRH3 Q9Y5N1 2/20 0.37
▸ BLM P54132 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ SCN1A P35498 4/20 0.35
▸ SCN2A Q99250 4/20 0.35
▸ SCN3A Q9NY46 4/20 0.35
▸ LMNA P02545 3/20 0.35
▸ ATM Q13315 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ CHRM2 P08172 1/20 0.33
▸ CHRM3 P20309 1/20 0.33
▸ HTR2C P28335 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705269 0.92 CYP2D6 (0.40) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL22097580 0.86 TSHR (0.36) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705721 0.83 PHLPP2 (0.50) MAOAHRH3BLMSCN1ASCN2A
SCHEMBL21705704 0.79 SMN1; SMN2 (0.40) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705270 0.78 TSHR (0.39) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705267 0.76 HTR3A (0.43) CYP2D6TSHRMAOAHTR3AHRH3
SCHEMBL21705268 0.72 SMN1; SMN2 (0.34) CYP2D6MAOAHTR3AHRH3SCN1A
SCHEMBL21705711 0.69 PHLPP2 (0.49) MAOAHRH3BLMSCN1ASCN2A
SCHEMBL21705228 0.69 KMT2A (0.56) CYP2D6TSHRNPSR1KDM4EMEN1
SCHEMBL21500917 0.68 KMT2A (0.56) TSHRLMNAKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 — — US disclosed
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