SCHEMBL21705899

SCHEMBL21705899

O=C(OCCCN1CCOCC1)c1cc(I)cc(I)c1I

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.54
KDM4E B2RXH2 1/20 0.54
PKM P14618 1/20 0.54
ALDH1A1 P00352 1/20 0.45
ATM Q13315 1/20 0.44
POLB P06746 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
LMNA P02545 2/20 0.42
KMT2A Q03164 1/20 0.42
HRH3 Q9Y5N1 3/20 0.40
DRD3 P35462 1/20 0.40
SLC29A1 Q99808 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705214 0.96 KDM4E (0.50) GAAKDM4EPKMALDH1A1ATM
SCHEMBL21705199 0.93 ATM (0.52) GAAKDM4EPKMALDH1A1ATM
SCHEMBL21705249 0.91 ALDH1A1 (0.46) GAAKDM4EPKMALDH1A1ATM
SCHEMBL21705252 0.91 ALDH1A1 (0.46) GAAKDM4EPKMALDH1A1ATM
SCHEMBL21705226 0.88 ALDH1A1 (0.46) GAAKDM4EPKMALDH1A1ATM
SCHEMBL26426637 0.84 HRH3 (0.41) GAAKDM4EPKMALDH1A1SMN1; SMN2
SCHEMBL21705605 0.81 ATM (0.54) GAAKDM4EPKMALDH1A1ATM
SCHEMBL22097596 0.81 ATM (0.53) GAAKDM4EPKMALDH1A1ATM
SCHEMBL26427818 0.81 ALDH1A1 (0.49) ALDH1A1SMN1; SMN2L3MBTL1LMNAKMT2A
SCHEMBL26426650 0.81 SLC29A1 (0.40) GAAKDM4EPKMALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR GAA 4569/4885KDM4E 2329/4885PKM 4147/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.