SCHEMBL26426650

SCHEMBL26426650

O=C(OCCCCN1CCS(=O)(=O)CC1)c1cc(I)cc(I)c1I

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC29A1 Q99808 3/20 0.40
HRH3 Q9Y5N1 5/20 0.38
DRD3 P35462 2/20 0.38
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
PKM P14618 1/20 0.37
BCHE P06276 3/20 0.36
HDAC3 O15379 1/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36
HDAC9 Q9UKV0 1/20 0.36
HDAC5 Q9UQL6 1/20 0.36
CYP2D6 P10635 3/20 0.35
MEN1 O00255 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426637 0.96 HRH3 (0.41) SLC29A1HRH3DRD3KDM4EGAA
SCHEMBL21783773 0.92 HRH3 (0.39) SLC29A1HRH3CYP2D6MEN1KMT2A
SCHEMBL26426639 0.86 KDM4E (0.41) SLC29A1HRH3DRD3KDM4EGAA
SCHEMBL21705214 0.85 KDM4E (0.50) SLC29A1KDM4EGAAPKMKMT2A
SCHEMBL21705616 0.81 HRH3 (0.39) SLC29A1HRH3CYP2D6MEN1KMT2A
SCHEMBL21705899 0.81 GAA (0.54) SLC29A1HRH3DRD3KDM4EGAA
SCHEMBL26427819 0.81 DRD2 (0.36) HRH3DRD3HDAC3HDAC4HDAC1
SCHEMBL21783772 0.79 HRH3 (0.49) SLC29A1HRH3DRD3KDM4EKMT2A
SCHEMBL21705754 0.79 KMT2A (0.50) SLC29A1KDM4ECYP2D6MEN1KMT2A
SCHEMBL21705232 0.79 HRH3 (0.40) SLC29A1HRH3DRD3KDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed