SCHEMBL21711067

SCHEMBL21711067

CC(N)CN1CCCNC1=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.46
PER2 O15055 3/20 0.44
MAPT P10636 1/20 0.44
ALDH1A1 P00352 2/20 0.42
KDM4E B2RXH2 1/20 0.42
HPGD P15428 1/20 0.42
HTT P42858 1/20 0.42
CRY2 Q49AN0 1/20 0.41
PIK3CD O00329 2/20 0.40
DPP4 P27487 2/20 0.38
DPP8 Q6V1X1 2/20 0.38
HTR2A P28223 2/20 0.33
HTR2C P28335 2/20 0.33
HTR2B P41595 2/20 0.33
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10849824 0.89 PER2 (0.42) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL8283567 0.85 PIK3CD (0.55) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL2195917 0.81 PER2 (0.51) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL8239457 0.81 SMN1; SMN2 (0.43) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL14422167 0.75 PER2 (0.56) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL6869257 0.74
SCHEMBL17599205 0.74
SCHEMBL13792388 0.74 SMN1; SMN2 (0.40) SMN1; SMN2PER2MAPTALDH1A1KDM4E
SCHEMBL2495679 0.73 PIK3CD (0.71) PER2ALDH1A1PIK3CDCYP1A2CYP2D6
SCHEMBL9427330 0.72 PER2 (0.44) SMN1; SMN2PER2MAPTALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11135544-B2 Acidic gas absorbent, acidic gas removal method and acidic gas removal apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2021-10-05 US disclosed
US-20200047110-A1 ACIDIC GAS ABSORBENT, ACIDIC GAS REMOVAL METHOD AND ACIDIC GAS REMOVAL APPARATUS KABUSHIKI KAISHA TOSHIBA (JP) 2020-02-13 US disclosed