Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSTP1 | P09211 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CYP11B1 | P15538 | 3/20 | 0.41 |
| ▸ | CYP11B2 | P19099 | 3/20 | 0.41 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.39 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29389195 | 1.00 | GSTP1 (0.41) | GSTP1ESR1ESR2CYP1A2SMN1; SMN2 | |
| SCHEMBL9372711 | 0.83 | SMN1; SMN2 (0.58) | CYP1A2SMN1; SMN2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL4413811 | 0.83 | KDM4E (0.39) | GSTP1ESR1ESR2CYP1A2SMN1; SMN2 | |
| SCHEMBL25817350 | 0.81 | GSTP1 (0.41) | GSTP1ESR1ESR2CYP1A2SMN1; SMN2 | |
| SCHEMBL21048184 | 0.80 | CYP1A1 (0.40) | CYP1A2ALDH1A1KDM4EHSD17B10MEN1 | |
| SCHEMBL29860227 | 0.80 | HSD17B1 (0.50) | GSTP1CYP1A2CYP11B1CYP11B2CYP17A1 | |
| SCHEMBL482246 | 0.80 | HSD17B1 (0.50) | GSTP1CYP1A2CYP11B1CYP11B2CYP17A1 | |
| SCHEMBL8412982 | 0.80 | NPC1 (0.38) | ALDH1A1KDM4EMEN1KMT2AHPGD | |
| SCHEMBL16928118 | 0.79 | HRH4 (0.50) | CYP1A2SMN1; SMN2CYP2C19 | |
| SCHEMBL125466 | 0.79 | MEN1 (0.44) | CYP1A2SMN1; SMN2ALDH1A1HSD17B10MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1289967-B1 | TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR | LG CHEMICAL LTD (KR) | 2009-10-28 | — | — | EP | claimed |
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-6797739-B1 | Triazene-based compound comprising functionalized alkylthio groups, and photopolymerization initiator | LG CHEMICAL CO., LTD. (KR) | 2004-09-28 | — | — | US | claimed |
| EP-1289967-A1 | TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR | LG Chemical Co. Ltd (KR) | 2003-03-12 | — | — | EP | claimed |
| WO-2001096317-A1 | TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR | LG CHEMICAL CO., LTD (KR) | 2001-12-20 | — | — | WO | claimed |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| EP-4610254-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2025-09-03 | — | — | EP | disclosed |
| WO-2025018116-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND POLYMER | 株式会社ADEKA | 2025-01-23 | — | — | WO | disclosed |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| EP-3597670-B1 | WATER-SOLUBLE COMPOSITION, PRODUCTION METHOD FOR CURED PRODUCT THEREOF, AND CURED PRODUCT THEREOF, AND ACYL PHOSPHINATE | ADEKA CORP (JP) | 2024-07-10 | — | — | EP | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| WO-2024090369-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | 株式会社ADEKA | 2024-05-02 | — | — | WO | disclosed |
| EP-0618933-A1 | PRESSURE-SENSITIVE ADHESIVE. | MINNESOTA MINING & MFG (US) | 1994-10-12 | — | — | EP | disclosed |
| US-5284735-A | Mixture of radical-polymerizable compound having two or more double bonds, photoinitiator, high molecular weight organic compound and di-substituted ethylene compound | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-02-08 | — | — | US | disclosed |
| WO-1993013149-A1 | PRESSURE-SENSITIVE ADHESIVE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-07-08 | — | — | WO | disclosed |
| US-5202361-A | Radiation curable; blend of acrylate esters, unsaturated monomers, a-olefin polymers and photoinitiator | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-04-13 | — | — | US | disclosed |
| US-5198325-A | PHOTOPOLYMERIZABLE MIXTURE, COPYING MATERIAL CONTAINING SAME AND PROCESS FOR PRODUCING HIGHLY HEAT-RESISTANT RELIEF STRUCTURES WHEREIN A TRIHALOMETHYL IS THE PHOTOINITIATOR | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-03-30 | — | — | US | disclosed |
| EP-0505094-A1 | Speed stabilised positive-acting photoresist compositions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-09-23 | — | — | EP | disclosed |
| EP-0292868-A2 | Light sensitive composition, registration material containing it and process for the fabrication of heat resistant relief structures | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-11-30 | — | — | EP | disclosed |
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | GSTP1 1379/4885ESR1 1240/4885ESR2 432/4885 |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | GSTP1 3412/4885ESR1 468/4885ESR2 1745/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.