Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 5/20 | 0.55 |
| ▸ | CA9 | Q16790 | 4/20 | 0.55 |
| ▸ | CA1 | P00915 | 3/20 | 0.55 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.42 |
| ▸ | CA7 | P43166 | 2/20 | 0.42 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | CA5A | P35218 | 1/20 | 0.42 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | AR | P10275 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 4/20 | 0.40 |
| ▸ | RAB9A | P51151 | 4/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL561014 | 0.74 | CA2 (0.68) | CA2CA9CA1CA12CA7 | |
| SCHEMBL28624040 | 0.74 | CA2 (0.68) | CA2CA9CA1CA12CA7 | |
| SCHEMBL28031304 | 0.74 | KMT2A (0.51) | CA2CA9CA1CYP19A1HTT | |
| SCHEMBL27724423 | 0.74 | HTT (0.55) | CA2CA9CA1CYP19A1HTT | |
| Lithium Ion SCHEMBL29131542 | 0.74 | CA2 (0.61) | CA2CA9CA1CA12CA7 | |
| Potassium Ion SCHEMBL12483362 | 0.74 | CA2 (0.61) | CA2CA9CA1CA12CA7 | |
| SCHEMBL5707068 | 0.74 | CA2 (0.61) | CA2CA9CA1CA12CA7 | |
| SCHEMBL2635217 | 0.74 | CA2 (0.61) | CA2CA9CA1CA12CA7 | |
| SCHEMBL22529366 | 0.73 | NPC1 (0.46) | CA2CA9CA1CYP19A1HTT | |
| SCHEMBL8970631 | 0.73 | HTT (0.66) | CA2CA9CA1CYP19A1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1284720-C | Lamination and picture composition method utilizing chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-11-15 | — | — | CN | claimed |
| CN-1500715-A | Lamination and picture composition method utilizing chemical self-assembly process | ���ǵ�����ʽ���� | 2004-06-02 | — | — | CN | claimed |
| EP-2913714-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING POLYIMIDE RESIN PATTERNS, AND PATTERNED POLYIMIDE RESIN FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2020-12-09 | — | — | EP | disclosed |
| CN-110494806-A | The manufacturing method of sensitized ray or radiation-sensitive resin composition, resist film, pattern forming method and electronic device | FUJIFILM CORP | 2019-11-22 | — | — | CN | disclosed |
| CN-110446952-A | Coloring film and its manufacturing method, solid-state imager | FUJIFILM CORP | 2019-11-12 | — | — | CN | disclosed |
| CN-110446951-A | Structure, composition for forming near-infrared transmitting filter layer, and optical sensor | FUJIFILM CORP | 2019-11-12 | — | — | CN | disclosed |
| CN-105073699-B | Compounds containing structural units derived from vinyl ether compounds | 东京应化工业株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-110352221-A | Composition, film, infrared intercepting filter, solid-state imager, infrared sensor, camera model and new compound | 富士胶片株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110119068-A | Positive type photosensitive organic compound, insulating film and image display device | 东友精细化工有限公司 | 2019-08-13 | — | — | CN | disclosed |
| CN-104508557-B | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film and the method for manufacturing electronic device | 富士胶片株式会社 | 2019-05-31 | — | — | CN | disclosed |
| CN-104508563-B | Pattern forming method and the electronic device manufacturing method and electronic device for respectively using it | 富士胶片株式会社 | 2019-05-28 | — | — | CN | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-20050079446-A1 | Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050014092-A1 | Novel compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040241577-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| CN-1500715-A | Lamination and picture composition method utilizing chemical self-assembly process | ���ǵ�����ʽ���� | 2004-06-02 | — | — | CN | disclosed |