Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | CA4 | P22748 | 1/20 | 0.50 |
| ▸ | CA7 | P43166 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | PYCR1 | P32322 | 11/20 | 0.41 |
| ▸ | IGLV6-57 | P01721 | 2/20 | 0.40 |
| ▸ | MAOB | P27338 | 2/20 | 0.39 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13338103 | 0.84 | CA12 (0.63) | CA12CA1CA2CA4CA7 | |
| SCHEMBL23960143 | 0.79 | CA12 (0.50) | CA12CA1CA2CA4CA7 | |
| SCHEMBL13627686 | 0.79 | CA12 (0.50) | CA12CA1CA2CA4CA7 | |
| SCHEMBL22680861 | 0.79 | MAOB (0.46) | CA12CA1CA2CA4CA7 | |
| SCHEMBL31327481 | 0.78 | CA12 (0.53) | CA12CA1CA2CA4CA7 | |
| SCHEMBL26582583 | 0.77 | CA12 (0.41) | CA12CA1CA2CA4CA7 | |
| SCHEMBL4403062 | 0.75 | ALDH1A1 (0.58) | TSHRLMNACYP3A4MAPK1TDP1 | |
| SCHEMBL11957492 | 0.74 | CA12 (0.42) | CA12CA1CA2CA4CA7 | |
| SCHEMBL22737722 | 0.74 | CYP2A6 (0.41) | CA2CYP2A6TSHRCYP3A4MAPK1 | |
| SCHEMBL10126415 | 0.74 | CA12 (0.53) | CA12CA1CA2CA4CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118993898-A | 1, 7-Dihalogenated-1, 6-heptadiyne derivative and preparation method thereof, and polymer of 1, 7-dihalogenated-1, 6-heptadiyne derivative and preparation method and application thereof | 西南林业大学 | 2024-11-22 | — | — | CN | disclosed |
| US-20230333469-A1 | FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230333469-A1 | FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-3747857-A1 | COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-09 | — | — | EP | disclosed |
| WO-2020218599-A1 | COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN AND PURIFICATION METHOD | 三菱瓦斯化学株式会社 | 2020-10-29 | — | — | WO | disclosed |
| WO-2020040162-A1 | COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM | 三菱瓦斯化学株式会社 | 2020-02-27 | — | — | WO | disclosed |