Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217689 | 1.00 | LMNA (0.46) | LMNACYP2C9ALDH1A1 | |
| SCHEMBL14523972 | 0.86 | LMNA (0.45) | LMNACYP2C9 | |
| SCHEMBL9880089 | 0.84 | LMNA (0.32) | LMNACYP2C9ALDH1A1 | |
| SCHEMBL328598 | 0.84 | LMNA (0.33) | LMNACYP2C9ALDH1A1 | |
| SCHEMBL13899248 | 0.83 | LMNA (0.52) | LMNACYP2C9 | |
| SCHEMBL14523971 | 0.82 | LMNA (0.41) | LMNACYP2C9 | |
| SCHEMBL6552985 | 0.80 | LMNA (0.52) | LMNACYP2C9 | |
| SCHEMBL13219806 | 0.80 | LMNA (0.41) | LMNACYP2C9 | |
| SCHEMBL3822886 | 0.79 | LMNA (0.36) | LMNACYP2C9 | |
| Methacrylic Acid SCHEMBL6387769 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 568 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270596-A1 | MEVALONATE DERIVATIVES AND METHODS FOR MAKING THE SAME | UNIV DUKE (US) | 2025-08-28 | — | — | US | claimed |
| US-12165870-B2 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | TOKYO ELECTRON LIMITED (JP) | 2024-12-10 | — | — | US | claimed |
| CN-104781731-B | Positive-working light-sensitive material | AZ电子材料卢森堡有限公司 | 2019-12-03 | — | — | CN | claimed |
| US-20180315596-A1 | CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATINGS AND DYED IMPLANT RESISTS | TOKYO ELECTRON LIMITED (JP) | 2018-11-01 | — | — | US | claimed |
| US-10020195-B2 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | TOKYO ELECTRON LIMITED (JP) | 2018-07-10 | — | — | US | claimed |
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | claimed |
| US-9732204-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-15 | — | — | US | claimed |
| US-9725611-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-08 | — | — | US | claimed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150241782-A1 | Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists | TOKYO ELECTRON LIMITED (JP) | 2015-08-27 | — | — | US | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| CN-1630551-A | Process for producing film forming resins for photoresist compositions | CLARIANT FINANCE BVI LTD (VG) | 2005-06-22 | — | — | CN | claimed |
| US-20050119378-A1 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | DUPONT ELECTRONICS, INC. | 2005-06-02 | — | — | US | claimed |
| CN-1615459-A | Method for preparing images using a first minimum bottom antireflective coating composition | CLARIANT FINANCE BVI LTD (VG) | 2005-05-11 | — | — | CN | claimed |
| WO-2005031461-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-07 | — | — | WO | claimed |
| US-6844131-B2 | Positive-working photoimageable bottom antireflective coating | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-01-18 | — | — | US | claimed |
| EP-1465877-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | claimed |
| WO-2003057678-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |