SCHEMBL21774693

SCHEMBL21774693

Cc1cc(C(c2cc(C)c(O)c(C)c2)c2cc(I)c(O)c(I)c2)cc(C)c1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 3/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
ALB P02768 1/20 0.37
PTGS1 P23219 5/20 0.36
PTGS2 P35354 5/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
LMNA P02545 2/20 0.34
HTT P42858 1/20 0.34
ALDH1A1 P00352 2/20 0.33
ALOX5 P09917 3/20 0.32
GAA P10253 2/20 0.32
ACHE P22303 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23627377 1.00 TTR (0.44) TTRCA1CA2ALBPTGS1
SCHEMBL18643164 0.91 TTR (0.41) TTRCA1CA2ALBPTGS1
SCHEMBL18643629 0.91 TTR (0.41) TTRCA1CA2ALBPTGS1
SCHEMBL673321 0.88 CA1 (0.55) TTRCA1CA2PTGS1PTGS2
SCHEMBL18855315 0.84 TTR (0.46) TTRCA1CA2ALBPTGS1
SCHEMBL18855332 0.82 TTR (0.44) TTRCA1CA2ALBPTGS1
SCHEMBL18778629 0.82 PTGS1 (0.44) TTRCA1CA2ALBPTGS1
SCHEMBL1595123 0.81 CA1 (0.48) TTRCA1CA2PTGS1PTGS2
SCHEMBL18855331 0.81 TTR (0.48) TTRALBPTGS1PTGS2ESR1
SCHEMBL21241741 0.81 PTGS1 (0.41) TTRCA1CA2PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-07-08 US disclosed
US-20210040290-A1 COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-11 US disclosed
EP-3747954-A1 COMPOSITION, RESIST-PATTERN FORMING METHOD, AND INSULATING-FILM FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-09 EP disclosed
WO-2020040161-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF TTR 3861/4885CA1 2960/4885CA2 4373/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.